Ion beam deposition, the Glossary
Ion beam deposition (IBD) is a process of applying materials to a target through the application of an ion beam.[1]
Table of Contents
14 relations: Carbon, Cathodic arc deposition, Electron beam-induced deposition, Electron ionization, Electronvolt, Electrospray ionization, Ion beam, Ion beam-assisted deposition, Ion implantation, Ion source, Mass spectrometry, Matrix-assisted laser desorption/ionization, Sputter deposition, Stoichiometry.
Carbon
Carbon is a chemical element; it has symbol C and atomic number 6.
See Ion beam deposition and Carbon
Cathodic arc deposition
Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. Ion beam deposition and Cathodic arc deposition are thin film deposition.
See Ion beam deposition and Cathodic arc deposition
Electron beam-induced deposition
Electron-beam-induced deposition (EBID) is a process of decomposing gaseous molecules by an electron beam leading to deposition of non-volatile fragments onto a nearby substrate.
See Ion beam deposition and Electron beam-induced deposition
Electron ionization
Electron ionization (EI, formerly known as electron impact ionization and electron bombardment ionization) is an ionization method in which energetic electrons interact with solid or gas phase atoms or molecules to produce ions.
See Ion beam deposition and Electron ionization
Electronvolt
In physics, an electronvolt (symbol eV), also written electron-volt and electron volt, is the measure of an amount of kinetic energy gained by a single electron accelerating through an electric potential difference of one volt in vacuum.
See Ion beam deposition and Electronvolt
Electrospray ionization
Electrospray ionization (ESI) is a technique used in mass spectrometry to produce ions using an electrospray in which a high voltage is applied to a liquid to create an aerosol.
See Ion beam deposition and Electrospray ionization
Ion beam
An ion beam is a type of charged particle beam consisting of ions. Ion beam deposition and ion beam are thin film deposition.
See Ion beam deposition and Ion beam
Ion beam-assisted deposition
Ion beam assisted deposition (IBAD or IAD) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Ion beam deposition and ion beam-assisted deposition are Nanotechnology stubs and thin film deposition.
See Ion beam deposition and Ion beam-assisted deposition
Ion implantation
Ion implantation is a low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the physical, chemical, or electrical properties of the target.
See Ion beam deposition and Ion implantation
Ion source
An ion source is a device that creates atomic and molecular ions.
See Ion beam deposition and Ion source
Mass spectrometry
Mass spectrometry (MS) is an analytical technique that is used to measure the mass-to-charge ratio of ions.
See Ion beam deposition and Mass spectrometry
Matrix-assisted laser desorption/ionization
In mass spectrometry, matrix-assisted laser desorption/ionization (MALDI) is an ionization technique that uses a laser energy-absorbing matrix to create ions from large molecules with minimal fragmentation.
See Ion beam deposition and Matrix-assisted laser desorption/ionization
Sputter deposition
Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. Ion beam deposition and sputter deposition are thin film deposition.
See Ion beam deposition and Sputter deposition
Stoichiometry
Stoichiometry is the relationship between the weights of reactants and products before, during, and following chemical reactions.
See Ion beam deposition and Stoichiometry