CN108550609A - Display panel and preparation method thereof, display device - Google Patents
- ️Tue Sep 18 2018
CN108550609A - Display panel and preparation method thereof, display device - Google Patents
Display panel and preparation method thereof, display device Download PDFInfo
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- CN108550609A CN108550609A CN201810457405.6A CN201810457405A CN108550609A CN 108550609 A CN108550609 A CN 108550609A CN 201810457405 A CN201810457405 A CN 201810457405A CN 108550609 A CN108550609 A CN 108550609A Authority
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/123—Connection of the pixel electrodes to the thin film transistors [TFT]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
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Abstract
The present invention relates to a kind of display panel and preparation method thereof, display devices.There is multirow pixel, the pixel to be formed by the way that organic luminous layer is deposited in the opening of viewing area pixel defining layer for display panel provided by the present application, including viewing area and slotted zones, the viewing area, and the pixel defining layer aperture opening ratio of the slotted zones is zero.TFT backplate structure is arranged simultaneously to viewing area and slotted zones in display panel provided by the present application, by way of making the corresponding pixel defining layer aperture opening ratio in slotted zones be zero, ensure that the load of the scan signal line of the pixel column where slotted zones is identical as the load of the scan signal line of other pixel columns, synchronism of the data signal line to pixel write data when is ensure that, to ensure that homogeneity that display panel is shown.
Description
Technical field
The present invention relates to display technology fields, more particularly to a kind of display panel and preparation method thereof, display device.
Background technology
With the development of display technology, for the functions such as self-timer, the video call of realizing mobile electronic device, display panel Usually setting is slotted for camera and peripheral driving circuit to be arranged above.The region that display panel shows for realizing image Region for display area, display panel fluting is non-display area.Pass through switch in the pixel of array distribution in display area Element connects scan signal line and data signal line, and the scanning signal of scan signal line output is used for the opening of control switch element And shutdown, the data-signal of data signal line output is for driving pixel to show certain grayscale.When display area is regular When rectangle, the number of pixels of each row is identical, and one-row pixels are driven simultaneously by a scan line.
During realizing traditional technology, it is found by the applicant that having at least the following problems：Display panel fluting causes to show It is regular rectangular shape to show region no longer, no longer includes pixel and corresponding driving circuit in slot area, each row pixel quantity not phase Together, drive the load of the scan signal line for pixel of not going together no longer identical, it is asynchronous when data signal line is to pixel write data, To influence the homogeneity that display panel is shown.
Invention content
Based on this, it is necessary in view of the above-mentioned problems, providing a kind of display panel and preparation method thereof, display device.
The application provides a kind of display panel, including viewing area and slotted zones, and the viewing area has multirow pixel, described Pixel is formed by the way that organic luminous layer is deposited in the opening of viewing area pixel defining layer, and the pixel defining layer of the slotted zones is opened Mouth rate is zero.
In one of which embodiment, the slotted zones and the viewing area include：
Underlay substrate；
The polysilicon layer formed on the underlay substrate, the polysilicon layer are used for conducting electric current；
The middle layer formed on the polysilicon layer；
The pixel defining layer formed on the middle layer, opening is provided in the pixel defining layer, and the opening is used In vapor deposition organic luminous layer；
Opening is not arranged in the pixel defining layer of the slotted zones and the pixel defining layer of the viewing area to be formed Supporting layer.
In one of which embodiment, the slotted zones include：
Underlay substrate；
The middle layer that the corresponding region in slotted zones is formed on the underlay substrate；
The pixel defining layer formed on the middle layer；
The supporting layer formed in the pixel defining layer.
In one of which embodiment, the middle layer includes：
Gate insulating layer；
The first metal layer formed on the gate insulating layer；
The interlayer insulating film formed on the first metal layer；
The second metal layer formed on the interlayer insulating film；
The passivation layer formed in the second metal layer；
The third metal layer formed on the passivation layer
The planarization layer formed on the third metal layer；
The anode layer formed on the planarization layer.
In one of which embodiment, the slotted zones are set in the top, side or bottom of the display panel Any place.
The application provides a kind of production method of display panel, and the display panel includes viewing area and slotted zones, described Method includes the following steps：
Underlay substrate is provided；
The deposit polycrystalline silicon layer on the underlay substrate, by lithography and etching by the polysilicon layer pattern；
Middle layer is formed on the polysilicon layer；
Pixel deposition definition layer on the intermediate layer, by lithography and etching by the corresponding pixel definition layer pattern in viewing area Change, makes to form opening in the corresponding pixel defining layer in viewing area, the opening is for being deposited organic luminous layer；
Opening is not arranged in the pixel defining layer of the slotted zones and the pixel defining layer of the viewing area to be formed Supporting layer.
In one of which embodiment, the deposit polycrystalline silicon layer on the underlay substrate passes through lithography and etching Include by the polysilicon layer pattern：
The corresponding area deposition polysilicon layer in viewing area on the underlay substrate, by lithography and etching by the polycrystalline Silicon layer patterns.
The application also provides a kind of display device, including display panel as described above.
Further include image acquisition mechanism in one of which embodiment, described image collecting mechanism is set to described open In slot area.
Further include receiver, microphone, light level in one of which embodiment, in the slot area of the display panel At least one of device, range sensor, fingerprint Identification sensor.
Display panel provided by the present application, the production method of display panel, display device to viewing area and slotted zones simultaneously TFT backplate structure is set, by way of making the corresponding pixel defining layer aperture opening ratio in slotted zones be zero, where guarantee slotted zones The load of the scan signal line of pixel column is identical as the load of the scan signal line of other pixel columns, ensure that data signal line pair Synchronism when pixel write data, to ensure that homogeneity that display panel is shown.
Description of the drawings
Fig. 1 is the pixel distribution schematic diagram for the display panel that one embodiment of the application provides；
Fig. 2 is cross-section structure (part) schematic diagram of the viewing area for the display panel that one embodiment of the application provides；
Fig. 3 is the flow chart of the production method for the display panel that one embodiment of the application provides.
100 slotted zones 101TFT back board structures
200 viewing area, 201 first viewing area
202 second viewing areas 203 are open
301 underlay substrate, 302 polysilicon layer
303 gate insulating layer, 304 the first metal layer
305 interlayer insulating film, 306 second metal layer
307 passivation layer, 308 third metal layer
309 planarization layer, 310 anode layer
311 pixel defining layer, 312 supporting layer
Specific implementation mode
To facilitate the understanding of the present invention, below with reference to relevant drawings to invention is more fully described.In attached drawing Give the preferred embodiment of the present invention.But the present invention can realize in many different forms, however it is not limited to herein Described embodiment.Keep the understanding to the disclosure more saturating on the contrary, purpose of providing these embodiments is It is thorough comprehensive.
It should be noted that when element is referred to as " being fixed on " another element, it can be directly on another element Or there may also be elements placed in the middle.When an element is considered as " connection " another element, it can be directly connected to To another element or it may be simultaneously present centering elements.Term as used herein " vertical ", " horizontal ", " left side ", " right side " and similar statement are for illustrative purposes only.
Unless otherwise defined, all of technologies and scientific terms used here by the article and belong to the technical field of the present invention The normally understood meaning of technical staff is identical.Used term is intended merely to description tool in the description of the invention herein The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more phases Any and all combinations of the Listed Items of pass.
For functions such as self-timer, the video calls of realizing mobile electronic device, display panel usually requires setting slotted zones Domain is for accommodating relevant element and peripheral driving circuit.No longer include pixel and corresponding driving circuit in slot area, shows Show that the pixel quantity of each row of panel is no longer identical, the load of signal line of each row pixel has differences, aobvious to influence display panel The homogeneity shown.
One embodiment of the application provides a kind of display panel, as shown in Figure 1, including viewing area 200 and slotted zones 100, there is multirow pixel, the pixel to have by being deposited at the opening 203 of 200 pixel defining layer 311 of viewing area for viewing area 200 Machine luminescent layer is formed, and the pixel defining layer aperture opening ratio of slotted zones 100 is zero.
Wherein, viewing area 200 includes the first viewing area 201 and the second viewing area 202.First viewing area 201 is that setting exists The special-shaped viewing area of 100 both sides of slotted zones, the second viewing area 202 are conventional viewing area.Without pixel distribution in slotted zones 100, Pixel in first viewing area 201 and the second viewing area 202 presses array regular array.Therefore, any row in the first viewing area 201 Pixel quantity be less than the second viewing area 202 in any row pixel quantity.Each pixel includes three sub-pixels, respectively R Sub-pixel, G sub-pixel, B sub-pixels.Each sub-pixel can show different grayscale under the control of driving circuit, to make Display panel can show colored image.
Specifically, the pixel of viewing area 200 in the pixel defining layer that includes in its TFT backplate structure 101 by being arranged Opening 203, and vapor deposition organic luminous layer is formed at opening 203.Include the corresponding driving electricity of pixel in TFT backplate structure 101 The load on road.Difference lies in TFT backplate structure 101 is arranged in slotted zones 100, but its TFT is carried on the back with viewing area 200 for slotted zones 100 The pixel defining layer for including in harden structure 101 is not provided with opening 203, i.e. the aperture opening ratio of pixel defining layer is zero.In addition, slotted zones Organic luminous layer is not deposited in 100 pixel defining layer, that is to say, that without pixel distribution in slotted zones 100.Although slotted zones 100 There is no pixel distribution, but since slotted zones 100 still include TFT backplate structure 101, slotted zones 100 are corresponded to comprising pixel Driving circuit load.Therefore, although display panel is provided with slotted zones, the pixel column of the first viewing area 201 is corresponding The load of the load drive signal line corresponding with the pixel column of the second viewing area 202 of drive signal line is consistent.
TFT backplate structure 101 is arranged simultaneously to viewing area 200 and slotted zones 100 in the display panel that above-described embodiment provides, By way of making 100 corresponding pixel defining layer aperture opening ratio of slotted zones be zero, ensure sweeping for the pixel column where slotted zones 100 The load for retouching signal wire is identical as the load of the scan signal line of other pixel columns, ensure that number is written to pixel in data signal line According to when synchronism, to ensure that homogeneity that display panel is shown.
In one embodiment provided by the present application, as shown in Fig. 2, the slotted zones 100 of display panel and viewing area 200 are wrapped It includes：Underlay substrate 301；The polysilicon layer 302 that 200 corresponding region of viewing area is formed on underlay substrate 301, the polysilicon layer 302 are used for conducting electric current；The middle layer formed on polysilicon layer 302；The pixel defining layer 311 formed on the intermediate layer, should Opening 203 is provided in pixel defining layer 311, the opening 203 is for being deposited organic luminous layer；Pixel in slotted zones 100 is fixed The supporting layer 312 of opening formation is not set in the pixel defining layer 311 of adopted layer 311 and viewing area 200.
Specifically, underlay substrate 301 is generally formed by depositing polyimides (PI) on the glass substrate.Glass in order to prevent Metal ion in glass, such as：Aluminium ion, barium ions, sodium ion etc. are diffused into technical process in polysilicon layer 302, lining Substrate 301 further includes generally the buffer layer being arranged between polysilicon layer 302 and polyimides.The material of buffer layer is generally Or mixtures thereof SiOx, SiNx can improve recrystallization by the thickness for changing buffer layer or the sedimentary condition for changing buffer layer The quality of the polysilicon of formation.The both ends of the polysilicon layer 302 deposited on underlay substrate 301 be injected separately into ion (such as phosphorus from Son or boron ion) it is doped the source region to form thin film transistor (TFT) (TFT) and drain region, the polysilicon layer between source electrode and drain electrode 302 can form conducting channel, play the role of conducting electric current.The middle layer made on polysilicon layer 302 is mainly used for shape At complete thin film transistor (TFT) and storage capacitance.The pixel defining layer 311 formed on the intermediate layer is used to limit the position of pixel, Marker space is formed between different pixels.Opening 203 is provided in pixel defining layer 311, organic luminous layer is vaporized on opening Pixel is formed at 203.It is not set in the pixel defining layer 311 of slotted zones 100 and the pixel defining layer 311 of viewing area 200 The supporting layer 312 of opening formation is set during organic luminous layer is deposited, TFT backplate structure is on the one hand used to support, protects Protect the integrality of pixel defining layer 311；On the other hand it is additionally operable to the mask plate of protection deposition luminous organic material.
The display panel that above-described embodiment provides passes through the polycrystalline that is formed on 200 corresponding underlay substrate 301 of viewing area Silicon layer 302 realizes the conducting of electric current in entire TFT backplate structure, to realize the driving to pixel, pixel is enable normally to send out Light.
In one embodiment provided by the present application, the slotted zones 100 of display panel include：Underlay substrate 301；In substrate The middle layer that 100 corresponding region of slotted zones is formed on substrate 301；The pixel defining layer 311 formed on the intermediate layer；In pixel The supporting layer 312 formed on definition layer 311.
Specifically, underlay substrate 301 is generally formed by depositing polyimides (PI) on the glass substrate.Glass in order to prevent Metal ion in glass, such as：Aluminium ion, barium ions, sodium ion etc. are diffused into technical process in polysilicon layer 302, lining Substrate 301 further includes generally the buffer layer being arranged between polysilicon layer 302 and polyimides.The material of buffer layer is generally Or mixtures thereof SiOx, SiNx can improve recrystallization by the thickness for changing buffer layer or the sedimentary condition for changing buffer layer The quality of the polysilicon of formation.The middle layer formed on 100 corresponding region of slotted zones on underlay substrate 301 is mainly used for shape At complete thin film transistor (TFT) and storage capacitance.The pixel defining layer 311 formed on the intermediate layer is not provided with out in slotted zones 100 Mouthful, organic luminous layer is not deposited in the pixel defining layer 311 of slotted zones 100, that is to say, that without pixel distribution in slotted zones 100. In the supporting layer 312 formed in pixel defining layer 311 during organic luminous layer is deposited, it is on the one hand used to support the TFT back ofs the body Harden structure 101 protects the integrality of pixel defining layer 311；On the other hand it is additionally operable to the mask of protection deposition luminous organic material Plate.As can be seen that slotted zones 100 and the difference of viewing area 200 also reside in the present embodiment, slotted zones 100 are not redeposited more Crystal silicon layer 302, therefore there is no current lead-through in 100 corresponding TFT backplate structure 101 of slotted zones, reduce the electricity of slotted zones 100 Amount consumption.
The display panel not deposit polycrystalline silicon layer on 100 corresponding underlay substrate 301 of slotted zones that above-described embodiment provides 302, make electric current in 100 corresponding TFT backplate structure of slotted zones that can not be connected, to reduce the electric quantity consumption of slotted zones 100.
In one embodiment provided by the present application, as shown in Fig. 2, the middle layer of display panel includes：Gate insulating layer 303；The first metal layer 304 formed on gate insulating layer 303；The interlayer insulating film formed on the first metal layer 304 305；The second metal layer 306 formed on interlayer insulating film 305；The passivation layer 307 formed in second metal layer 306； The third metal layer 308 formed on passivation layer 307；The planarization layer 309 formed on third metal layer 308；In planarization layer The anode layer 310 formed on 309.
Specifically, gate insulating layer 303 is for making to insulate between the first metal layer 304 and polysilicon layer 302.Gate insulator The grid-control capacitance structure of thin film transistor (TFT) is collectively formed in layer 303, the first metal layer 304,303 three of gate insulating layer.Grid is exhausted The material of edge layer 303 can be the oxide of silicon, can also be that the nitride of silicon or the oxide of silicon are formed with nitride Mixture.The first metal layer 304 formed on gate insulating layer 303 as thin film transistor (TFT) grid and storage capacitance one A pole plate.Insulation dielectric of the interlayer insulating film 305 formed on the first metal layer 304 as storage capacitance.It is exhausted in interlayer Another pole plate of the second metal layer 306 formed in edge layer 305 as storage capacitance, that is to say, that the first metal layer 304, layer Between insulating layer 305,306 three of second metal layer collectively form storage capacitance.Meanwhile interlayer insulating film 305 is additionally operable to realization Insulation between one metal layer 304 and third metal layer 308.The passivation layer 307 formed in second metal layer 306 is for limiting Position of opening so that third metal layer 308 is connected into source region and drain region on polysilicon layer 302 by trepanning, formed grid and Drain electrode.Meanwhile passivation layer 307 is additionally operable to realize the insulation between second metal layer 306 and third metal layer 308.In third gold Belong to the planarization layer 309 formed on layer 308 for realizing the planarization of the layer structure formed on underlay substrate 301, is conducive to The uniform vapor deposition of machine luminescent layer.The anode layer 310 formed in planarization is used to form organic luminescent device.
The display panel that above-described embodiment provides forms complete thin film transistor (TFT) and storage capacitance by middle layer, to open Slot area 100 provides load, ensures the load of the scan signal line of the pixel column where slotted zones 100 and sweeping for other pixel columns The load for retouching signal wire is identical, synchronism of the data signal line to pixel write data when is ensure that, to ensure that display surface The homogeneity that plate is shown.
In one embodiment provided by the present application, slotted zones 100 are set in the top, side or bottom of display panel Any place.
One embodiment of the application provides a kind of production method of display panel, as shown in figure 3, the display panel includes Viewing area 200 and slotted zones 100, the above method includes the following steps：
S100:Underlay substrate is provided.
Wherein, underlay substrate 301 is generally formed by depositing polyimides (PI) on the glass substrate.Glass in order to prevent In metal ion, such as：Aluminium ion, barium ions, sodium ion etc. are diffused into technical process in polysilicon layer 302, substrate Substrate 301 further includes generally the buffer layer being arranged between polysilicon layer 302 and polyimides.In addition, buffer layer can be in standard Molecular laser slows down the cooling rate of the silicon heated by laser when annealing, it is polysilicon buffering layer to be conducive to non-crystalline silicon recrystallization Material is generally or mixtures thereof SiOx, SiNx, and the thickness by changing buffer layer or the sedimentary condition for changing buffer layer can Improve the quality for the polysilicon that recrystallization is formed.
S200:The deposit polycrystalline silicon layer on underlay substrate, by lithography and etching by polysilicon layer pattern.
Specifically, one layer of non-crystalline silicon (a-Si) layer is deposited on underlay substrate 301, is passed through quasi-molecule laser annealing (ELA) Technique converts amorphous silicon layer to polysilicon (poly-Si) layer.After the completion of crystallization, lithography and etching is carried out to polysilicon layer 302, The figure being pre-designed in reticle is formed on polysilicon layer 302.
S300:Middle layer is formed on the polysilicon layer.
Wherein, middle layer includes：Gate insulating layer 303；The first metal layer 304 formed on gate insulating layer 303； The interlayer insulating film 305 formed on the first metal layer 304；The second metal layer 306 formed on interlayer insulating film 305； The passivation layer 307 formed on two metal layers 306；The third metal layer 308 formed on passivation layer 307；In third metal layer 308 The planarization layer 309 of upper formation；The anode layer 310 formed on planarization layer 309.
Specifically, gate insulating layer 303 is deposited on polysilicon layer 302.The first metal is deposited on gate insulating layer 303 Layer 304 forms on the first metal layer 304 figure on corresponding mask plate by lithography and etching.In the first metal layer 304 It is upper deposition from level to level between insulating layer 305.The depositing second metal layer 306 on interlayer insulating film 305, by lithography and etching The figure on corresponding mask plate is formed on two metal layers 306.Deposit passivation layer 307, passes through photoetching in second metal layer 306 The figure on corresponding mask plate is formed on passivation layer 307 with etching.Third metal layer 308 is deposited on passivation layer 307, is led to Cross the figure that lithography and etching is formed on third metal layer 308 on corresponding mask plate.It is deposited on third metal layer 308 flat Smoothization layer 309 forms on planarization layer 309 figure on corresponding mask plate by lithography and etching.In planarization layer 309 Upper Deposition anode layer 310 forms on anode layer 310 figure on corresponding mask plate by lithography and etching.
S400:Pixel deposition definition layer on the intermediate layer, by lithography and etching by the corresponding pixel defining layer in viewing area Patterning makes to form opening in the corresponding pixel defining layer in viewing area.
Specifically, pixel deposition definition layer 311 on the intermediate layer carries out light to the corresponding pixel defining layer in viewing area 311 It carves and etching, the formation opening 203 in the corresponding pixel defining layer 311 in viewing area forms pixel for organic luminous layer to be deposited. It is then not provided with opening 203 for 100 corresponding pixel defining layer 311 of slotted zones, organic luminous layer is not also deposited.
S500:Opening is not set in the pixel defining layer of slotted zones and the pixel defining layer of viewing area and forms support Layer.
Wherein, 312 one side of supporting layer is used to support TFT backplate structure 101, protects the integrality of pixel defining layer 311； On the other hand it is additionally operable to the mask plate of protection deposition luminous organic material.Specifically, in the pixel defining layer 311 of slotted zones 100 And opening depositing support layer 312 is not set in the pixel defining layer 311 of viewing area 200, it is being supported by lithography and etching The figure on corresponding mask plate is formed on layer 312.
The TFT back ofs the body are arranged to viewing area 200 and slotted zones 100 in the production method for the display panel that above-described embodiment provides simultaneously Harden structure ensures the picture where slotted zones 100 by way of making 100 corresponding pixel defining layer aperture opening ratio of slotted zones be zero The load of the scan signal line of plain row is identical as the load of the scan signal line of other pixel columns, ensure that data signal line to picture Synchronism when element write-in data, to ensure that homogeneity backboard that display panel is shown.Simultaneously as viewing area 200 TFT backplate structure and the TFT backplate structure synchronization of slotted zones 100 make, therefore greatly reduce the complexity of technique, are conducive to Reduce cost.
In one embodiment provided by the present application, the deposit polycrystalline silicon layer 302 on underlay substrate 301, by photoetching and Etching patterns polysilicon layer 302：
The 200 corresponding area deposition polysilicon layer 302 of viewing area on underlay substrate 301, will be more by lithography and etching Crystal silicon layer 302 patterns.
Specifically, when forming polysilicon layer 302 on underlay substrate 301, only for 200 corresponding underlay substrate of viewing area 301 deposit polycrystalline silicon layers 302, without 100 corresponding underlay substrate of cross-notching area, 301 deposit polycrystalline silicon layer 302, therefore slotted zones There is no current lead-through in 100 corresponding TFT backplate structures 101, reduces the electric quantity consumption of slotted zones 100.
The production method for the display panel that above-described embodiment provides is sunk not on 100 corresponding underlay substrate 301 of slotted zones Product polysilicon layer 302, makes electric current in 100 corresponding TFT backplate structure of slotted zones that can not be connected, to reduce slotted zones 100 Electric quantity consumption.
One embodiment of the application provides a kind of display device, including display panel as described above.
Specifically, the display device include but not limited to mobile phone, tablet computer, laptop, with display function Wearable electronic.The display device shares compensating unit by setting, is realizing to 200 load of signal line of special-shaped viewing area While compensating, the width of frame is reduced as much as possible, is conducive to improve screen accounting, is realized screen display comprehensively.
In one embodiment provided by the present application, display device further includes image acquisition mechanism, and image acquisition mechanism is set It is placed in slotted zones 100.
Specifically, image acquisition mechanism can be camera.The camera is arranged in the slotted zones 100 with display panel. Above-mentioned display device can realize the functions such as camera shooting and video calling by image acquisition mechanism.
In one embodiment provided by the present application, display device further includes receiver, microphone, light in slotted zones 100 At least one of sensor, range sensor, fingerprint Identification sensor.
Specifically, voice output when receiver is for realizing call or played voice message.Microphone is for conversing or recording Voice input when speech message.Light sensor is used to detect the light intensity in environment, and is adjusted and shown according to ambient light Show the display parameters of panel.Range sensor is then used to prevent the maloperation to display panel, for example display panel is made to converse Shi Zidong breaths screen prevents display panel from being automatically waken up in pocket.Fingerprint Identification sensor then user identity for identification, To realize the unlock of display device.
Each technical characteristic of embodiment described above can be combined arbitrarily, to keep description succinct, not to above-mentioned reality It applies all possible combination of each technical characteristic in example to be all described, as long as however, the combination of these technical characteristics is not deposited In contradiction, it is all considered to be the range of this specification record.
Several embodiments of the invention above described embodiment only expresses, the description thereof is more specific and detailed, but simultaneously It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention Range.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (10)
1. a kind of display panel, which is characterized in that including viewing area and slotted zones, the viewing area has multirow pixel, described Pixel is formed by the way that organic luminous layer is deposited in the opening of viewing area pixel defining layer, and the pixel defining layer of the slotted zones is opened Mouth rate is zero.
2. display panel according to claim 1, which is characterized in that the slotted zones and the viewing area include：
Underlay substrate；
The polysilicon layer formed on the underlay substrate, the polysilicon layer are used for conducting electric current；
The middle layer formed on the polysilicon layer；
The pixel defining layer formed on the middle layer is provided with opening, institute in the corresponding pixel defining layer in the viewing area Opening is stated for organic luminous layer to be deposited；
The branch of opening formation is not set in the pixel defining layer of the slotted zones and the pixel defining layer of the viewing area Support layer.
3. display panel according to claim 1, which is characterized in that the slotted zones include：
Underlay substrate；
The middle layer that the corresponding region in slotted zones is formed on the underlay substrate；
The pixel defining layer formed on the middle layer；
The supporting layer formed in the pixel defining layer.
4. display panel according to claim 2 or 3, which is characterized in that the middle layer includes：
Gate insulating layer；
The first metal layer formed on the gate insulating layer；
The interlayer insulating film formed on the first metal layer；
The second metal layer formed on the interlayer insulating film；
The passivation layer formed in the second metal layer；
The third metal layer formed on the passivation layer；
The planarization layer formed on the third metal layer；
The anode layer formed on the planarization layer.
5. display panel according to claim 1, which is characterized in that the slotted zones are set to the top of the display panel Any place in portion, side or bottom.
6. a kind of production method of display panel, the display panel includes viewing area and slotted zones, which is characterized in that the side Method includes the following steps：
Underlay substrate is provided；
The deposit polycrystalline silicon layer on the underlay substrate, by lithography and etching by the polysilicon layer pattern；
Middle layer is formed on the polysilicon layer；
Pixel deposition definition layer on the intermediate layer makes by lithography and etching by the corresponding pixel definition pattern layers in viewing area Opening is formed in the corresponding pixel defining layer in viewing area, the opening is for being deposited organic luminous layer；
Opening is not set in the pixel defining layer of the slotted zones and the pixel defining layer of the viewing area and forms support Layer.
7. the production method of display panel according to claim 6, which is characterized in that described to sink on the underlay substrate Polysilicon layer is accumulated, includes by the polysilicon layer pattern by lithography and etching：
The corresponding area deposition polysilicon layer in viewing area on the underlay substrate, by lithography and etching by the polysilicon layer Patterning.
8. a kind of display device, which is characterized in that including the display panel described in any one of claim 1-5.
9. display device according to claim 8, which is characterized in that further include image acquisition mechanism, described image acquisition Mechanism is set in the slotted zones.
10. display device according to claim 8, which is characterized in that the slotted zones of the display panel further include receiver, At least one of microphone, light sensor, range sensor, fingerprint Identification sensor.
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Cited By (6)
* Cited by examiner, † Cited by third party| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109411523A (en) * | 2018-12-03 | 2019-03-01 | 武汉天马微电子有限公司 | Display panel and display device |
| CN109801947A (en) * | 2019-01-31 | 2019-05-24 | 上海天马有机发光显示技术有限公司 | A kind of display panel and display device |
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