CN116125564B - AG cover plate and processing method - Google Patents
- ️Tue Feb 18 2025
CN116125564B - AG cover plate and processing method - Google Patents
AG cover plate and processing method Download PDFInfo
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- CN116125564B CN116125564B CN202111338909.4A CN202111338909A CN116125564B CN 116125564 B CN116125564 B CN 116125564B CN 202111338909 A CN202111338909 A CN 202111338909A CN 116125564 B CN116125564 B CN 116125564B Authority
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
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Abstract
本申请涉及盖板技术领域,尤其涉及一种AG盖板及加工方法,包括盖板,所述盖板相对设置的第一表面和第二表面分别具有微结构A和微结构B,所述微结构A由凹坑A1……An组成,所述微结构B由凹坑B1……Bn组成,其中n为大于1的自然数;所述凹坑An与所述凹坑Bn呈互补对应关系,当n相同时,所述凹坑An等比例缩放后能够与所述凹坑Bn镜像对称;所述凹坑A1……An之间呈非周期性排布;所述凹坑B1……Bn之间呈非周期性排布。如此设置,会大大减轻或者解决闪点问题以及清晰度问题;当外界的光线照射到盖板时,由于盖板表面存在的互补型微结构,就会对于光线产生散射现象,从而实现AG效果,并解决了摩尔纹和贴合精度需求的问题。
The present application relates to the technical field of cover plates, and in particular to an AG cover plate and a processing method, including a cover plate, wherein the first surface and the second surface of the cover plate are arranged opposite to each other and have microstructures A and B, respectively, wherein the microstructure A is composed of pits A1...An, and the microstructure B is composed of pits B1...Bn, wherein n is a natural number greater than 1; the pits An and the pits Bn are in a complementary corresponding relationship, and when n is the same, the pits An can be mirror-symmetrical with the pits Bn after proportional scaling; the pits A1...An are arranged non-periodically; the pits B1...Bn are arranged non-periodically. Such a setting will greatly reduce or solve the flash point problem and the clarity problem; when external light irradiates the cover plate, due to the complementary microstructures on the surface of the cover plate, the light will be scattered, thereby achieving the AG effect and solving the problems of moiré and fitting accuracy requirements.
Description
Technical Field
The application relates to the technical field of cover plates, in particular to an AG cover plate and a processing method.
Background
AG (anti-dazzle) glass cover plate is a functional cover plate, can reduce interference of ambient light, improve visual angle of display picture and reduce screen reflection. The AG cover plate is generally processed on the surface, the smooth surface is processed into a surface with a microstructure and a certain roughness, and the original glass surface can be converted into a matte diffuse reflection surface from specular reflection, so that anti-dazzle effects such as lamp shadow resistance, sunlight resistance and the like are realized.
However, the AG cover plate has problems such as diffraction and scattering due to the surface microstructure, thereby changing the original light propagation path, resulting in problems of flash point and sharpness. If a periodic AG structure is used, although flash point and sharpness problems are alleviated, moire may occur and AG effect may be reduced. In addition, because a certain corresponding relation exists between the periodic structure and the pixels, when the AG cover plate is attached to the display panel, the AG cover plate can be attached only after accurate alignment, the process difficulty is improved, and the attaching production efficiency is reduced.
Therefore, how to solve the problems of diffraction and scattering of the existing AG cover plate, which have the problems of flash point and poor definition, is a key technical problem to be solved by those skilled in the art.
Disclosure of Invention
In order to overcome the problems in the related art to at least a certain extent, the application aims to provide an AG cover plate and a processing method thereof, which can solve the problems of diffraction and scattering, and poor flash point and definition of the existing AG cover plate. The preferred technical solutions of the technical solutions provided by the present application can produce a plurality of technical effects described below.
The application provides An AG cover plate, which comprises a cover plate, wherein a first surface and a second surface which are oppositely arranged are respectively provided with a microstructure A and a microstructure B, the microstructure A consists of pits A1.
The pit An and the pit Bn are in complementary corresponding relation, and when n is the same, the pit An can be mirror-symmetrical with the pit Bn after equal-proportion scaling;
the pit a1. The two parts are arranged in a non-periodic way;
the pit b1. The two are arranged in a non-periodic way.
Preferably, the microstructures a are periodically arranged on the first surface;
the microstructures B are periodically distributed on the second surface.
Preferably, the transition between the pit An and the first surface and the transition between the pit Bn and the second surface are made by circular arcs.
Preferably, the microstructure B is close to the pre-attached display panel relative to the microstructure a, when the light source of the display panel is a collimated light source, the size of the pit An is the same as that of the pit Bn, and when the light source of the display panel is a divergent light source, the size of the pit An is larger than that of the pit Bn.
Preferably, the pit An is configured as a cambered surface gradually recessed toward the second surface along the direction from the edge to the middle;
The pit Bn is arranged as an arc surface gradually recessed toward the first surface along the direction from the edge to the middle.
Preferably, n has a value in the range of 100-1000.
Preferably, the size of the pits An and the pits Bn is in the range of 0.1 to 100 micrometers.
The application also provides a processing method of the AG cover plate, which is based on any one of the AG cover plates, and is characterized by comprising the following steps:
determining the focal depth area of the laser beam according to the shape and the size of the pit An and the pit Bn to be processed;
Utilizing the focal depth area of the laser beam to align with the area to be processed on the cover plate, and modifying the pit An and the pit Bn;
and etching the modified areas to be processed into the pits An and the pits Bn.
Preferably, it comprises:
determining the spot energy of a laser beam according to the shape and the size of the pit An and the pit Bn to be processed;
and modifying the area between the pit An and the first surface of the cover plate and between the pit Bn and the second surface of the cover plate to be processed by utilizing the light spot edge with gradually changed energy of the laser beam.
Preferably, it comprises:
determining the focal position of a laser beam according to the sizes of the pit An and the pit Bn to be processed;
If the size of the pit An is equal to the size of the pit Bn, the focal point of the laser beam is equidistant from the first surface and the second surface of the cover plate;
if the size of the pit An is larger than the size of the pit Bn, the focal point of the laser beam is close to the second surface of the cover plate.
Preferably, it comprises:
determining a processing drawing of a laser beam according to the arrangement information of the pits An and the pits Bn;
And according to the periodicity of the microstructure A and the microstructure B, the processing drawing of the laser beam is periodically arranged.
The technical scheme provided by the application can comprise the following beneficial effects:
Because pit An and pit Bn are all sunken in the inside of apron, and pit An and pit Bn have strict corresponding relation to make the direction of the outside emergent light of display panel through the apron change or change has certain rule, realize complementary effect, will alleviate or solve flash point and definition problem like this greatly. Moreover, the pits A1 are arranged in An aperiodic manner between the pits A, pit b1. Between Bn is arranged in a non-periodic way. The above-mentioned aperiodic arrangement refers to random arrangement between pits a.i. and between pits b.i. and Bn, and there is no arrangement rule, and the shape and size of each pit may also be different to realize AG effect.
The arrangement is that the direction of emergent light from the display panel to the outside through the cover plate is not changed or is changed with a certain rule by adopting the complementary microstructure, so that the flash point problem and the definition problem are greatly reduced or solved; meanwhile, when external light irradiates the cover plate, due to the fact that the pits An and the pits Bn are arranged in An aperiodic mode on the surface of the cover plate, scattering phenomena can be generated on the light, AG effect is achieved, and the problem of the requirements on Moire patterns and attaching precision is solved.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the application as claimed.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the application and together with the description, serve to explain the principles of the application.
In order to more clearly illustrate the embodiments of the invention or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the invention, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a block diagram of the present AG cover plate shown in accordance with some exemplary embodiments;
FIG. 2 is a ray path diagram of the present AG cover plate shown in accordance with some exemplary embodiments;
fig. 3 is a process block diagram of the present AG cover plate according to some example embodiments.
In the figure, 1 part of the cover plate, 2 parts of the pit An, 3 parts of the pit Bn, 4 parts of the laser beam, 5 parts of the vibrating mirror.
Detailed Description
Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, the same numbers in different drawings refer to the same or similar elements, unless otherwise indicated. The implementations described in the following exemplary examples do not represent all implementations consistent with the application. Rather, they are merely examples of apparatus or methods consistent with aspects of the application.
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be described in detail below. It will be apparent that the described embodiments are only some, but not all, embodiments of the invention. All other embodiments, based on the examples herein, which are within the scope of the invention as defined by the claims, will be within the scope of the invention as defined by the claims.
Hereinafter, embodiments will be described with reference to the drawings. Furthermore, the embodiments shown below do not limit the summary of the invention described in the claims. The whole contents of the constitution shown in the following examples are not limited to the solution of the invention described in the claims.
Referring to fig. 1-3, the present embodiment provides An AG cover plate, wherein the fighting surface and the second surface of the cover plate, which are disposed opposite to each other, have a microstructure a and a microstructure B, respectively, the microstructure a being composed of pits a1.
The pit An and the pit Bn are in complementary corresponding relation, and when n is the same, the pit An can be mirror-symmetrical with the pit Bn after equal proportion scaling, so that the microstructure A and the microstructure B form a complementary microstructure, and further the complementary effect is realized. The scaling of the equal ratio here refers to the original ratio of ensuring that the length, width and height of the pit An are fixed, so as to realize the enlargement or reduction without changing the ensured shape.
Because pit An and pit Bn are all sunken in the inside of apron, and pit An and pit Bn have strict corresponding relation to make the direction of the outside emergent light of display panel through the apron change or change has certain rule, realize complementary effect, will alleviate or solve flash point and definition problem like this greatly.
Moreover, the pits A1 are arranged in An aperiodic manner between the pits A, pit b1. Between Bn is arranged in a non-periodic way. The above-mentioned aperiodic arrangement refers to random arrangement between pits a.i. and between pits b.i. and Bn, and there is no arrangement rule, and the shape and size of each pit may also be different to realize AG effect.
The arrangement is that the direction of emergent light from the display panel to the outside through the cover plate is not changed or is changed with a certain rule by adopting the complementary microstructure, so that the flash point problem and the definition problem are greatly reduced or solved; meanwhile, when external light irradiates the cover plate, due to the fact that the pits An and the pits Bn are arranged in An aperiodic mode on the surface of the cover plate, scattering phenomena can be generated on the light, AG effect is achieved, and the problem of the requirements on Moire patterns and attaching precision is solved.
Further, the microstructures A are periodically arranged on the first surface, the microstructures B are periodically arranged on the second surface, namely, the cover plate is periodically divided into a plurality of array areas, and each array area is roughened by the microstructures A and the microstructures B, so that the complementary microstructures can be subjected to modularized treatment, the processing is convenient, and the flash point and the mole lines can be reduced.
The microstructure A and the microstructure B have certain periodicity, so that the definition can be improved, the flash point can be reduced, and meanwhile, the mole lines are not easy to occur. The specific periodic size is also related to the pixel size, structure, and type of the display panel, and is not limited herein.
The periodic arrangement refers to the arrangement of the microstructures A and the microstructures B with consistency, so that the formed complementary microstructures are arranged in a matrix on the cover plate, and the cover plate is ensured to have large-size periodic arrangement.
In addition, the pit An and the first surface of the cover plate and the pit Bn and the second surface of the cover plate are in arc transition, so that a certain curvature radius requirement exists between the pit An and the first surface and between the pit Bn and the second surface of the cover plate.
Since the size of each of the pits An and Bn is in the order of micrometers, the radius of curvature thereof is also in the order of micrometers, at most in the order of millimeters. However, the edges of the pits An and Bn, that is, the surface of the cover plate is flat glass and the radius of curvature is infinite, so that the position is set as a transitional cambered surface, and the cambered surface has a gradual curvature radius, so that the curvature radius of the micrometer or millimeter level continuously changes to infinity instead of forming abrupt changes of the curvature radius, and the occurrence of flash points can be effectively reduced.
The pit An is arranged as An arc surface gradually recessed toward the second surface along the direction from the edge to the middle, and the pit Bn is arranged as An arc surface gradually recessed toward the first surface along the direction from the edge to the middle. So that the curvature radius inside the pit An and the pit Bn is gradually and continuously changed, the abrupt change of the curvature radius is avoided, the occurrence of flash point is reduced, and the display panel is beneficial to realizing that the direction of emergent light outwards from the display panel through the cover plate is not changed or has a certain rule.
In some embodiments, after the cover plate is mounted on the display panel in a fitting manner, the second groove is close to the display panel relative to the first groove, where the dimensional relationship between the first groove and the second groove is mainly related to the light source of the display panel, and when the light source of the display panel is a collimated light source, the dimensions of the first groove and the second groove are the same, and when the light source of the display panel is a divergent light source, the dimensions of the first groove are larger than those of the second groove. In this way flash points can be effectively avoided.
The shape of the pit An and the pit Bn may be identical, or may be different, and may be square, circular, or any other shape. However, to ensure the projection of the pits An and Bn on the surface of the cover plate, the pits may be overlapped after being enlarged or reduced in An equal proportion.
In some preferred embodiments, n has a value in the range of 100 to 1000. The microstructure A and the microstructure B are composed of 100-1000 pits, so that a good AG effect can be ensured.
Since the size of the pits An and Bn is generally smaller than the pixel size of the display panel, the AG effect may be reduced if the pits are too small, and crosstalk between pixels may be caused to reduce the definition if the pit size is too large. Therefore, according to a general pixel size, the sizes of the pits An and Bn are set to 0.1-100 micrometers so that the size of a single pit is smaller than the pixel size to ensure proper AG effect and definition. And the relationship between the minimum pit size and the pixel size is also related to the combination of different pit sizes of different display panels, and the relationship is not limited herein.
Note that the structures of the pits An and Bn are not limited to those shown in fig. 1, and the complementary microstructures formed in the present application are all those having a relationship in which the propagation direction or directions of the original light rays are not changed after passing through the complementary microstructures. Moreover, the size, shape, and surface state of the pits are also common, and are not limited to the structure shown in fig. 1.
The application also provides a processing method of the AG cover plate, which comprises the following steps:
determining the focal depth area of the laser beam according to the shape and the size of the pit An and the pit Bn to be processed;
The focal depth of the laser beam is a certain focal depth when the laser beam is focused, pits An and pits Bn on the two surfaces of the cover plate can be processed simultaneously by using the focal depth of the laser beam, and the focal depth area of the laser beam is changed by controlling the focal position and the focal depth, so that the formed focal depth area can correspond to the complementary microstructure to be processed. And according to the difference of the complementary microstructures, the difference processing of the pits An and the pits Bn on the two surfaces of the cover plate can be realized by controlling the position of the focal depth area of the mechanism relative to the cover plate, and the sizes, the depths and the like of the pits An and the pits Bn on the two surfaces of the cover plate are changed. Is beneficial to realizing different complementary effects.
Utilizing the focal depth area of the laser beam to align with the areas of the pits An and Bn to be processed on the cover plate for modification;
the areas of the pits An and Bn to be processed on the cover plate are irradiated through the focal depth area of the laser beam, and chemical bond fracture can be generated in the areas due to the light spot energy of the laser beam, so that the etching effect can be generated in the subsequent etching process.
Specifically, an ultrafast laser may be used for processing, and the laser path may be controlled by a galvanometer scanning method. The machining can be performed in a single pulse mode to improve production efficiency, or in a multi-pulse mode to improve machining precision, and the machining can be actually selected according to requirements of pits An and pits Bn.
It should be noted that the laser beam may be an ultrafast laser, a continuous laser, or a specific implementation of the processing method may be a laser or a laser combined with other processes, and other processes for implementing the complementary optical structure.
And etching the areas of the modified pits An and Bn to be processed.
The etching can be directly performed by using laser beams, and the ablation effect of the modified area is realized mainly by adjusting laser beam parameters, so that the processing of the pits An and Bn can be realized. Here, unlike the modification process, the etching process cannot perform double-sided simultaneous etching, and only the pits An and Bn can be etched on one side.
Of course, the method can also be realized by wet etching, and the modified area is mainly prepared by using the difference of chemical properties between the laser modified area and the unmodified area through acid etching and alkali etching, and a small amount of chemical bonds are broken on the cover plate after modification, so that the chemical reaction is more facilitated. By the method, differential etching can be realized, so that the processing of the pits An and Bn is realized.
Thus, the complementary microstructure is modified by using the laser beam, in particular to an ultrafast laser beam, which has high pulse energy, high processing speed and easy control of energy density. When the surface modification etching processing of the cover plate is realized, the method has the advantages of high speed, high precision and easy control. In addition, by matching with wet etching and other processes, better effects can be realized.
In this embodiment, the step of modifying the area of the pit An and the pit Bn to be processed on the cover plate by using the focal depth area of the laser beam includes:
Determining the spot energy of a laser beam according to the shape and the size of the pits An and Bn to be processed;
The areas between the pits An to be processed and the first surface of the cover plate and between the pits Bn and the second surface of the cover plate are modified by using the light spot edges of the energy gradation of the laser beam.
The principle of modifying by using the energy of the laser beam spot edge is that the laser beam spot edge energy is lower and gradually changed, so that a continuously-changing curvature removing area can be generated in the subsequent etching process, and the smooth transition of the curvature radius of the area is realized, so that the arc transition between the pit An and the first surface of the cover plate and between the pit Bn and the second surface of the cover plate is formed.
In determining the focal depth region of the laser beam, further comprising:
determining the focal position of the laser beam according to the sizes of the pits An and Bn to be processed;
If the size of the pit An is equal to the size of the pit Bn, the focal point of the laser beam is equidistant from the first surface and the second surface of the cover plate;
If the size of the pit An is larger than the size of the pit Bn, the focal point of the laser beam is close to the second surface of the cover plate.
The focal position is positioned in the center of the focal depth area, and the distance between the focal position of the laser beam and the first surface and the second surface of the cover plate is controlled, so that the sizes of pits An and Bn formed on the two surfaces of the machined cover plate can be changed, and further differential machining of the complementary microstructures A and B is realized.
It should be noted that, based on the influence of other factors, parameter information of the laser beam needs to be determined, including the size of the laser beam spot to determine the sizes of the pits An and Bn processed by the laser beam, the repetition frequency of the laser beam to determine the processing speeds of the pits An and Bn, the energy of the laser beam spot to affect the sizes, the modification or etching ranges, the depth, etc. of the pits An and Bn, and the energy arrangement of the laser beam spot to determine the curvature arrangement of the pits An and Bn.
In order to optimize the processing flow, reduce the processing drawing design degree of difficulty, also can satisfy simultaneously and get rid of mole line, realize AG structure arrangement's effect, this processing method still includes:
Determining a processing drawing of the laser beam according to the arrangement information of the pits An and Bn;
According to the periodicity of the microstructures A and B, the processing drawing of the laser beam is periodically arranged.
In this way, the processing drawings of the microstructure A and the microstructure B are determined firstly, and modularized matrix arrangement is performed to form an integral processing drawing, so that the complementary microstructures on the processed cover plate can meet the unordered arrangement of small areas and realize the matrix arrangement of modules in a large area range.
It should be noted that, the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", etc. are used herein for convenience of description and simplicity of description only, and do not indicate or imply that the apparatus or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the invention. Furthermore, the terms "first," "second," "third," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description herein, it should also be noted that the terms "mounted," "connected," and "coupled" are to be construed broadly, as well as, for example, fixedly coupled, detachably coupled, or integrally coupled, mechanically coupled, electrically coupled, directly coupled, or indirectly coupled via an intervening medium, unless otherwise specifically indicated and defined. The specific meaning of the above terms in the present invention can be understood as appropriate by those of ordinary skill in the art.
The foregoing is merely illustrative of the present invention, and the present invention is not limited thereto, and any person skilled in the art will readily recognize that variations or substitutions are within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
It is to be understood that the same or similar parts in the above embodiments may be referred to each other, and that in some embodiments, the same or similar parts in other embodiments may be referred to. The schemes provided by the application comprise the basic schemes of the schemes, are independent of each other and are not mutually restricted, but can be combined with each other under the condition of no conflict, so that a plurality of effects are realized together.
While embodiments of the present application have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the application, and that variations, modifications, alternatives, and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the application.
Claims (10)
1.一种AG盖板,其特征在于,包括盖板,所述盖板相对设置的第一表面和第二表面分别具有微结构A和微结构B,所述微结构A由凹坑A1……An组成,所述微结构B由凹坑B1……Bn组成,其中n为大于1的自然数;1. An AG cover plate, characterized in that it comprises a cover plate, wherein a first surface and a second surface of the cover plate disposed opposite to each other respectively have a microstructure A and a microstructure B, wherein the microstructure A is composed of pits A1...An, and the microstructure B is composed of pits B1...Bn, wherein n is a natural number greater than 1; 所述凹坑An与所述凹坑Bn呈互补对应关系,当n相同时,所述凹坑An等比例缩放后能够与所述凹坑Bn镜像对称;The concave pit An and the concave pit Bn are in a complementary corresponding relationship. When n is the same, the concave pit An can be mirror-symmetrical with the concave pit Bn after being scaled in proportion; 所述凹坑A1……An之间呈非周期性排布;The pits A1...An are arranged non-periodically; 所述凹坑B1……Bn之间呈非周期性排布;The pits B1...Bn are arranged non-periodically; 所述微结构A在所述第一表面呈周期性排布;The microstructures A are periodically arranged on the first surface; 所述微结构B在所述第二表面呈周期性排布;The microstructures B are periodically arranged on the second surface; 多个所述微结构A和多个所述微结构B的排布具有一致性。The arrangement of the plurality of microstructures A and the plurality of microstructures B is consistent. 2.根据权利要求1所述的AG盖板,其特征在于,所述凹坑An与所述第一表面之间、所述凹坑Bn与所述第二表面之间通过圆弧过渡。2. The AG cover plate according to claim 1 is characterized in that the pit An and the first surface, and the pit Bn and the second surface are transitioned by circular arcs. 3.根据权利要求1所述的AG盖板,其特征在于,所述微结构B相对于所述微结构A靠近预贴合的显示面板;3. The AG cover plate according to claim 1, wherein the microstructure B is closer to the pre-bonded display panel relative to the microstructure A; 当所述显示面板的光源为准直光源时,所述凹坑An与所述凹坑Bn的尺寸相同;When the light source of the display panel is a collimated light source, the size of the pit An is the same as that of the pit Bn; 当所述显示面板的光源为发散光源时,所述凹坑An的尺寸大于所述凹坑Bn的尺寸。When the light source of the display panel is a divergent light source, the size of the pit An is greater than the size of the pit Bn. 4.根据权利要求1所述的AG盖板,其特征在于,所述凹坑An设置为沿边沿至中部的方向逐渐向所述第二表面凹陷的弧面;4. The AG cover plate according to claim 1, characterized in that the pit An is configured as an arc surface that gradually sinks toward the second surface from the edge to the middle; 所述凹坑Bn设置为沿边沿至中部的方向逐渐向所述第一表面凹陷的弧面。The pit Bn is configured as an arc surface that gradually sinks toward the first surface along a direction from the edge to the middle. 5.根据权利要求1所述的AG盖板,其特征在于,n的取值范围为100-1000。5. The AG cover plate according to claim 1, characterized in that the value range of n is 100-1000. 6.根据权利要求1所述的AG盖板,其特征在于,所述凹坑An和所述凹坑Bn尺寸范围为0.1-100微米。6. The AG cover plate according to claim 1, characterized in that the size range of the pit An and the pit Bn is 0.1-100 microns. 7.一种AG盖板的加工方法,基于权利要求1-6任意一项所述的AG盖板,其特征在于,包括:7. A method for processing an AG cover plate, based on the AG cover plate according to any one of claims 1 to 6, characterized in that it comprises: 根据待加工的凹坑An和凹坑Bn的形状尺寸,确定激光束的焦深区域;Determine the focal depth of the laser beam according to the shape and size of the pit An and the pit Bn to be processed; 利用激光束的焦深区域对准盖板上待加工所述凹坑An和所述凹坑Bn的区域进行改性;Using the focal depth area of the laser beam to align with the area on the cover plate where the pit An and the pit Bn are to be processed for modification; 对改性后的待加工所述凹坑An和所述凹坑Bn的区域进行刻蚀。The modified areas of the pit An and the pit Bn to be processed are etched. 8.根据权利要求7所述的AG盖板的加工方法,其特征在于,包括:8. The method for processing the AG cover plate according to claim 7, characterized in that it comprises: 根据待加工所述凹坑An和所述凹坑Bn的形状尺寸,确定激光束的光斑能量;Determine the spot energy of the laser beam according to the shape and size of the pit An and the pit Bn to be processed; 利用激光束的能量渐变的光斑边缘的对待加工所述凹坑An与所述盖板的第一表面之间、所述凹坑Bn与所述盖板的第二表面之间的区域进行改性。The area between the pit An and the first surface of the cover plate and the area between the pit Bn and the second surface of the cover plate to be processed are modified by using the edge of the spot with gradually changing energy of the laser beam. 9.根据权利要求7所述的AG盖板的加工方法,其特征在于,包括:9. The method for processing the AG cover plate according to claim 7, characterized in that it comprises: 根据待加工的所述凹坑An和所述凹坑Bn的尺寸,确定激光束的焦点位置;Determining the focal position of the laser beam according to the sizes of the pit An and the pit Bn to be processed; 若所述凹坑An的尺寸等于所述凹坑Bn的尺寸,则激光束的焦点与盖板的第一表面和第二表面等距;If the size of the pit An is equal to the size of the pit Bn, the focus of the laser beam is equidistant from the first surface and the second surface of the cover plate; 若所述凹坑An的尺寸大于所述凹坑Bn的尺寸,则激光束的焦点靠近于盖板的第二表面。If the size of the pit An is larger than the size of the pit Bn, the focus of the laser beam is close to the second surface of the cover plate. 10.根据权利要求7所述的AG盖板的加工方法,其特征在于,包括:10. The method for processing the AG cover plate according to claim 7, characterized in that it comprises: 根据所述凹坑An和所述凹坑Bn的排布信息,确定激光束的加工图纸;Determining a processing drawing of a laser beam according to arrangement information of the pits An and the pits Bn; 根据所述微结构A和所述微结构B的周期性,将激光束的加工图纸周期性排布。According to the periodicity of the microstructure A and the microstructure B, the processing drawings of the laser beam are arranged periodically.
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