JPS5730385A - Semiconductor light emitting element - Google Patents
- ️Thu Feb 18 1982
JPS5730385A - Semiconductor light emitting element - Google Patents
Semiconductor light emitting elementInfo
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Publication number
- JPS5730385A JPS5730385A JP10416080A JP10416080A JPS5730385A JP S5730385 A JPS5730385 A JP S5730385A JP 10416080 A JP10416080 A JP 10416080A JP 10416080 A JP10416080 A JP 10416080A JP S5730385 A JPS5730385 A JP S5730385A Authority
- JP
- Japan Prior art keywords
- light emitting
- layer
- forming
- semiconductor
- bias electrode Prior art date
- 1980-07-29 Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 6
- 239000000758 substrate Substances 0.000 abstract 4
- 239000012535 impurity Substances 0.000 abstract 3
- 239000013078 crystal Substances 0.000 abstract 2
- 230000010354 integration Effects 0.000 abstract 2
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H29/00—Integrated devices, or assemblies of multiple devices, comprising at least one light-emitting semiconductor element covered by group H10H20/00
- H10H29/10—Integrated devices comprising at least one light-emitting semiconductor component covered by group H10H20/00
Landscapes
- Semiconductor Lasers (AREA)
- Led Devices (AREA)
Abstract
PURPOSE:To increase the integration of a semiconductor light emitting element by forming a light emitting part on a semiconductor substrate having a bias electrode on the lower surface, forming an FET layer via an insulating layer having a grooved hole, and then forming a control electrode and other bias electrode. CONSTITUTION:Light emitting parts 12, 13, 15 forming a light emitting p-n junction 14 are formed on a semiconductor substrate 11 having a bias electrode 19 on the lower surface. After an FET layer 18 is formed via an insulating layer 16 having a grooved hole 17, a control electrode 21 and other bias electrode 20 are formed. A substrate 11 has one conductive type impurity, and a light emitting part is formed with the single crystal layer of the semiconductor containing the same conductive type impurity as the substrate as the lowermost layer. An FET layer is formed of signal crystal containing the same conductive type impurity as the semiconductor of the uppermost layer. Thus, the light signal is controlled directly, the integration is increased, and the reliability is improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10416080A JPS5730385A (en) | 1980-07-29 | 1980-07-29 | Semiconductor light emitting element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10416080A JPS5730385A (en) | 1980-07-29 | 1980-07-29 | Semiconductor light emitting element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5730385A true JPS5730385A (en) | 1982-02-18 |
Family
ID=14373304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10416080A Pending JPS5730385A (en) | 1980-07-29 | 1980-07-29 | Semiconductor light emitting element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5730385A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0067566A2 (en) * | 1981-06-13 | 1982-12-22 | Plessey Overseas Limited | Integrated light detection or generation means and amplifying means |
JPS60130880A (en) * | 1983-12-19 | 1985-07-12 | Mitsubishi Electric Corp | Semiconductor laser device |
JPS60140776A (en) * | 1983-12-27 | 1985-07-25 | Nec Corp | Semiconductor laser triode |
JPS6170782A (en) * | 1984-09-14 | 1986-04-11 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
JPS61101090A (en) * | 1984-10-24 | 1986-05-19 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
JPS61218194A (en) * | 1985-03-23 | 1986-09-27 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser |
US5003358A (en) * | 1987-08-05 | 1991-03-26 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor light emitting device disposed in an insulating substrate |
US5144377A (en) * | 1991-04-04 | 1992-09-01 | University Of Delaware | High-speed heterojunction light-emitting diode |
US5194399A (en) * | 1987-08-05 | 1993-03-16 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor light emitting device disposed in an insulating substrate |
US5275968A (en) * | 1987-08-05 | 1994-01-04 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor light emitting device disposed in an insulating substrate |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5210082A (en) * | 1975-07-14 | 1977-01-26 | Mitsubishi Electric Corp | Semiconductor device |
JPS52147087A (en) * | 1976-06-01 | 1977-12-07 | Mitsubishi Electric Corp | Semiconductor light emitting display device |
-
1980
- 1980-07-29 JP JP10416080A patent/JPS5730385A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5210082A (en) * | 1975-07-14 | 1977-01-26 | Mitsubishi Electric Corp | Semiconductor device |
JPS52147087A (en) * | 1976-06-01 | 1977-12-07 | Mitsubishi Electric Corp | Semiconductor light emitting display device |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0067566A2 (en) * | 1981-06-13 | 1982-12-22 | Plessey Overseas Limited | Integrated light detection or generation means and amplifying means |
JPS60130880A (en) * | 1983-12-19 | 1985-07-12 | Mitsubishi Electric Corp | Semiconductor laser device |
JPS60140776A (en) * | 1983-12-27 | 1985-07-25 | Nec Corp | Semiconductor laser triode |
JPS6170782A (en) * | 1984-09-14 | 1986-04-11 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
JPS61101090A (en) * | 1984-10-24 | 1986-05-19 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
JPS61218194A (en) * | 1985-03-23 | 1986-09-27 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser |
US5003358A (en) * | 1987-08-05 | 1991-03-26 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor light emitting device disposed in an insulating substrate |
US5100833A (en) * | 1987-08-05 | 1992-03-31 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor light emitting device disposed in an insulating substrate |
US5194399A (en) * | 1987-08-05 | 1993-03-16 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor light emitting device disposed in an insulating substrate |
US5275968A (en) * | 1987-08-05 | 1994-01-04 | Mitsubishi Denki Kabushiki Kaisha | Method of producing a semiconductor light emitting device disposed in an insulating substrate |
US5144377A (en) * | 1991-04-04 | 1992-09-01 | University Of Delaware | High-speed heterojunction light-emitting diode |
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