MY145225A - Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp - Google Patents
- ️Fri Jan 13 2012
Info
-
Publication number
- MY145225A MY145225A MYPI20062536A MYPI20062536A MY145225A MY 145225 A MY145225 A MY 145225A MY PI20062536 A MYPI20062536 A MY PI20062536A MY PI20062536 A MYPI20062536 A MY PI20062536A MY 145225 A MY145225 A MY 145225A Authority
- MY
- Malaysia Prior art keywords
- features
- transfer
- present
- adhesion
- methods Prior art date
- 2005-06-02
Links
- 238000010023 transfer printing Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 abstract 4
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000002153 concerted effect Effects 0.000 abstract 1
- 230000010354 integration Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Thin Film Transistor (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Weting (AREA)
Abstract
PATTERN TRANSFER PRINTING BY KINETIC CONTROL OF ADHESION TO AN ELASTOMERIC STAMP THE PRESENT INVENTION PROVIDES METHODS, SYSTEMS AND SYSTEM COMPONENTS FOR 5 TRANSFERRING, ASSEMBLING AND INTEGRATING FEATURES AND ARRAYS OF FEATURES HAVING SELECTED NANOSIZED AND/OR MICROSIZED PHYSICAL DIMENSIONS, SHAPES AND SPATIAL ORIENTATIONS. METHODS OF THE PRESENT INVENTION UTILIZE PRINCIPLES OF 'SOFT ADHESION'TO GUIDE THE TRANSFER, ASSEMBLY AND/OR INTEGRATION OF FEATURES, SUCH AS PRINTABLE SEMICONDUCTOR ELEMENTS OR OTHER COMPONENTS OF ELECTRONIC DEVICES. METHODS OF THE PRESENT INVENTION ARE USEFUL FOR 10 TRANSFERRING FEATURES FROM A DONOR SUBSTRATE TO THE TRANSFER SURFACE OF AN ELASTOMERIC TRANSFER DEVICE AND, OPTIONALLY, FROM THE TRANSFER SURFACE OF AN ELASTOMERIC TRANSFER DEVICE TO THE RECEIVING SURFACE OF A RECEIVING SUBSTRATE. THE PRESENT METHODS AND SYSTEMS PROVIDE HIGHLY EFFICIENT, REGISTERED TRANSFER OF FEATURES AND ARRAYS OF FEATURES, SUCH AS PRINTABLE SEMICONDUCTOR ELEMENT, IN A CONCERTED MANNER THAT MAINTAINS THE 15 RELATIVE SPATIAL ORIENTATIONS OF TRANSFERRED FEATURES. DOOG)OI/06/&
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2005/019354 WO2005122285A2 (en) | 2004-06-04 | 2005-06-02 | Methods and devices for fabricating and assembling printable semiconductor elements |
US11/145,542 US7557367B2 (en) | 2004-06-04 | 2005-06-02 | Stretchable semiconductor elements and stretchable electrical circuits |
US11/145,574 US7622367B1 (en) | 2004-06-04 | 2005-06-02 | Methods and devices for fabricating and assembling printable semiconductor elements |
Publications (1)
Publication Number | Publication Date |
---|---|
MY145225A true MY145225A (en) | 2012-01-13 |
Family
ID=41576388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI20062536A MY145225A (en) | 2005-06-02 | 2006-06-01 | Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp |
Country Status (3)
Country | Link |
---|---|
CN (2) | CN101632156B (en) |
MY (1) | MY145225A (en) |
TW (1) | TWI420237B (en) |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008036837A2 (en) | 2006-09-20 | 2008-03-27 | The Board Of Trustees Of The University Of Illinois | Release strategies for making transferable semiconductor structures, devices and device components |
US7927976B2 (en) | 2008-07-23 | 2011-04-19 | Semprius, Inc. | Reinforced composite stamp for dry transfer printing of semiconductor elements |
US8506867B2 (en) | 2008-11-19 | 2013-08-13 | Semprius, Inc. | Printing semiconductor elements by shear-assisted elastomeric stamp transfer |
US8261660B2 (en) | 2009-07-22 | 2012-09-11 | Semprius, Inc. | Vacuum coupled tool apparatus for dry transfer printing semiconductor elements |
CN101924173A (en) * | 2010-05-28 | 2010-12-22 | 孙文红 | High lighting effect pattern substrate and manufacturing method thereof |
TWI415284B (en) * | 2011-03-10 | 2013-11-11 | Gintech Energy Corp | Solar cell electrode making device and method thereof |
WO2012158709A1 (en) | 2011-05-16 | 2012-11-22 | The Board Of Trustees Of The University Of Illinois | Thermally managed led arrays assembled by printing |
US9824851B2 (en) * | 2013-01-20 | 2017-11-21 | William M. Tong | Charge drain coating for electron-optical MEMS |
CN103873011A (en) * | 2014-03-05 | 2014-06-18 | 随州泰华电子科技有限公司 | Automatic folding device of tuning fork chip |
CN107078088B (en) * | 2014-06-18 | 2021-04-09 | 艾克斯展示公司技术有限公司 | Microassembled high frequency devices and arrays |
KR102085212B1 (en) * | 2014-07-20 | 2020-03-05 | 엑스-셀레프린트 리미티드 | Apparatus and methods for micro-transfer printing |
US20160093600A1 (en) * | 2014-09-25 | 2016-03-31 | X-Celeprint Limited | Compound micro-assembly strategies and devices |
CN105024688B (en) * | 2015-07-01 | 2017-09-15 | 东南大学 | The NAND gate of gallium nitride base low-leakage current clamped beam |
CN105161490B (en) * | 2015-07-01 | 2018-02-06 | 东南大学 | Gallium nitride base low-leakage current cantilever beam field-effect transistor phase inverter and preparation method |
CN104967410B (en) * | 2015-07-01 | 2017-11-07 | 东南大学 | Silicon substrate low-leakage current clamped beam grid field effect transistor difference amplifier |
CN105140227B (en) * | 2015-07-01 | 2017-12-05 | 东南大学 | The NAND gate of gallium nitride base low-leakage current cantilever beam |
CN105049033B (en) * | 2015-07-01 | 2017-11-24 | 东南大学 | Nor gate based on GaAs base low-leakage current double cantilever beam switch |
CN105304499A (en) * | 2015-10-20 | 2016-02-03 | 上海集成电路研发中心有限公司 | Preparation method for flexible carbon-nanotube field effect transistor |
CN105355563A (en) * | 2015-11-26 | 2016-02-24 | 上海集成电路研发中心有限公司 | Preparation method of flexible semiconductor device |
CN115966503A (en) | 2016-10-04 | 2023-04-14 | 维耶尔公司 | Microdevice Arrangement in Donor Substrate |
CN106383403B (en) * | 2016-12-08 | 2020-11-10 | 中国科学院光电技术研究所 | A stretchable and deformable metasurface color display device |
CN108231534A (en) * | 2016-12-15 | 2018-06-29 | 上海新微技术研发中心有限公司 | Method for manufacturing flexible film |
FR3063854B1 (en) * | 2017-03-13 | 2021-08-27 | Commissariat Energie Atomique | SAW RESONATOR WITH PARASITE WAVE ATTENUATION LAYERS |
CN109103101B (en) * | 2017-06-21 | 2020-09-29 | 清华大学 | Preparation method of nano-microstructure |
CN109103090B (en) * | 2017-06-21 | 2020-12-04 | 清华大学 | Preparation method of nanobelt |
CN110890309B (en) * | 2018-09-10 | 2023-09-08 | 桦榆国际有限公司 | Graphite disk repair method |
CN109342325B (en) * | 2018-10-30 | 2023-12-19 | 南开大学 | A method and device for anisotropic microscopic imaging of low-dimensional materials |
KR20200026768A (en) * | 2019-11-22 | 2020-03-11 | 엘지전자 주식회사 | Fabricating method for display device using semiconductor light emitting device and self-assembly device used therein |
CN111622996B (en) * | 2020-04-27 | 2022-05-24 | 江苏科技大学 | Heterogeneous multi-valve parallel drive electro-hydraulic servo system and control method |
CN111934071B (en) * | 2020-06-19 | 2021-10-22 | 西安理工大学 | A TSV-based Ridge-Substrate Integrated Waveguide Bandpass Filter |
CN111947794B (en) * | 2020-07-31 | 2023-01-31 | 电子科技大学 | A kind of preparation method of superconducting nanowire single photon detector |
CN112526660B (en) * | 2020-11-11 | 2022-12-09 | 歌尔股份有限公司 | Method for manufacturing nano-grating on curved surface, optical device and electronic equipment |
US11747555B2 (en) | 2021-10-04 | 2023-09-05 | Eagle Technology, Llc | Optical assembly having commonly-shaped optical modules and associated methods |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4766670A (en) * | 1987-02-02 | 1988-08-30 | International Business Machines Corporation | Full panel electronic packaging structure and method of making same |
US6060723A (en) * | 1997-07-18 | 2000-05-09 | Hitachi, Ltd. | Controllable conduction device |
KR100275730B1 (en) * | 1998-05-11 | 2000-12-15 | 윤종용 | Trench isolating method |
US6373092B1 (en) * | 1998-09-29 | 2002-04-16 | Texas Instruments Incorporated | Staggered-edge capacitor electrode |
US6403397B1 (en) * | 2000-06-28 | 2002-06-11 | Agere Systems Guardian Corp. | Process for fabricating organic semiconductor device involving selective patterning |
JP4092914B2 (en) * | 2001-01-26 | 2008-05-28 | セイコーエプソン株式会社 | MASK MANUFACTURING METHOD, ORGANIC ELECTROLUMINESCENT DEVICE MANUFACTURING METHOD |
KR100391984B1 (en) * | 2001-08-08 | 2003-07-22 | 삼성전자주식회사 | Semiconductor memory device having multiple tunnel junction layer pattern and method of fabricating the same |
KR101049624B1 (en) * | 2003-02-03 | 2011-07-15 | 호야 가부시키가이샤 | Photomask blank, photomask, and pattern transfer method using photomask |
TWI273019B (en) * | 2003-07-25 | 2007-02-11 | Hon Hai Prec Ind Co Ltd | A method of transfer pattern |
-
2006
- 2006-06-01 CN CN2006800196400A patent/CN101632156B/en active Active
- 2006-06-01 CN CN201110077508.8A patent/CN102176465B/en active Active
- 2006-06-01 MY MYPI20062536A patent/MY145225A/en unknown
- 2006-06-01 TW TW095119788A patent/TWI420237B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI420237B (en) | 2013-12-21 |
CN102176465B (en) | 2014-05-07 |
TW200710562A (en) | 2007-03-16 |
CN101632156B (en) | 2012-06-20 |
CN101632156A (en) | 2010-01-20 |
CN102176465A (en) | 2011-09-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MY145225A (en) | 2012-01-13 | Pattern transfer printing by kinetic control of adhesion to an elastomeric stamp |
WO2004097518A3 (en) | 2005-07-21 | A method of forming stepped structures employing imprint lithography |
WO2004013900A3 (en) | 2004-07-22 | System and method for manufacturing embedded conformal electronics |
MY149190A (en) | 2013-07-31 | Release strategies for making transferable semiconductor structures, devices and device components |
TW200703599A (en) | 2007-01-16 | Offset integrated circuit package-on-package stacking system |
TW200740036A (en) | 2007-10-16 | Electronic device quick connect system |
EP1338431A3 (en) | 2003-10-01 | Visible image receiving material having surface hydrophilicity |
TW200746231A (en) | 2007-12-16 | Method to produce semiconductor components and thin-film semiconductor components |
TW200802797A (en) | 2008-01-01 | Electronic substrate, semiconductor device, and electronic device |
TW200715708A (en) | 2007-04-16 | Electronic substrate, manufacturing method for electronic substrate, and electronic device |
MY189260A (en) | 2022-01-31 | Methods and devices for fabricating and assembling printable semiconductor elements |
GB2428883B (en) | 2009-12-16 | Gravure plate, method for forming light-emitting layer or hole-injection layer using the same, and organic light-emitting device |
EP1894234A4 (en) | 2015-01-21 | Substrate stiffness method and resulting devices for layer transfer processes |
EP1488359A4 (en) | 2009-11-04 | Electronic transfer system |
WO2008099784A1 (en) | 2008-08-21 | Led package and structure for mounting three-dimensional circuit component |
TWI315553B (en) | 2009-10-01 | Flexible printed wiring board, method for fabricating flexible printed wiring board, and semiconductor device |
WO2004055886A3 (en) | 2004-12-29 | Manipulation of objects with fluid droplets |
TW200721552A (en) | 2007-06-01 | Optoelectronic semiconductor chip |
ATE521480T1 (en) | 2011-09-15 | OPAK EQUIPPED SUBSTRATE |
WO2009056420A3 (en) | 2009-10-22 | Micromechanical system |
TW200633002A (en) | 2006-09-16 | Micro-nanometer transfer printer |
TW200742099A (en) | 2007-11-01 | Silicon carbon germanium (SiCGe) substrate for a group III nitride-based device |
DE60312232D1 (en) | 2007-04-12 | Esslernhilfe |
WO2008155028A9 (en) | 2009-05-14 | Method and device for forming a three-dimensional arrangement of biological cells |
TW200632950A (en) | 2006-09-16 | Method to form a thin film resistor |