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SG94843A1 - Method and apparatus for chemically polishing liquid crystal glass substrate - Google Patents

  • ️Tue Mar 18 2003
Method and apparatus for chemically polishing liquid crystal glass substrate

Info

Publication number
SG94843A1
SG94843A1 SG200103698A SG200103698A SG94843A1 SG 94843 A1 SG94843 A1 SG 94843A1 SG 200103698 A SG200103698 A SG 200103698A SG 200103698 A SG200103698 A SG 200103698A SG 94843 A1 SG94843 A1 SG 94843A1 Authority
SG
Singapore
Prior art keywords
liquid crystal
glass substrate
polishing liquid
crystal glass
chemically polishing
Prior art date
2001-04-12
Application number
SG200103698A
Inventor
Nishiyama Tomohiro
Deguchi Mikio
Itokawa Katsuhiro
Odani Makoto
Mizoguchi Koichi
Original Assignee
Nishiyama Stainless Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
2001-04-12
Filing date
2001-06-05
Publication date
2003-03-18
2001-06-05 Application filed by Nishiyama Stainless Chemical Co Ltd filed Critical Nishiyama Stainless Chemical Co Ltd
2003-03-18 Publication of SG94843A1 publication Critical patent/SG94843A1/en

Links

  • 239000011521 glass Substances 0.000 title 1
  • 239000004973 liquid crystal related substance Substances 0.000 title 1
  • 238000000034 method Methods 0.000 title 1
  • 238000005498 polishing Methods 0.000 title 1
  • 239000000758 substrate Substances 0.000 title 1

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1313Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers
    • H01L21/02008Multistep processes
    • H01L21/0201Specific process step
    • H01L21/02019Chemical etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67063Apparatus for fluid treatment for etching
    • H01L21/67075Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00Technologies for solid waste management
    • Y02W30/50Reuse, recycling or recovery technologies
    • Y02W30/52Mechanical processing of waste for the recovery of materials, e.g. crushing, shredding, separation or disassembly
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00Technologies for solid waste management
    • Y02W30/50Reuse, recycling or recovery technologies
    • Y02W30/60Glass recycling

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)
SG200103698A 2001-04-12 2001-06-05 Method and apparatus for chemically polishing liquid crystal glass substrate SG94843A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001114498 2001-04-12

Publications (1)

Publication Number Publication Date
SG94843A1 true SG94843A1 (en) 2003-03-18

Family

ID=18965559

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200103698A SG94843A1 (en) 2001-04-12 2001-06-05 Method and apparatus for chemically polishing liquid crystal glass substrate

Country Status (4)

Country Link
KR (1) KR100380844B1 (en)
CN (2) CN1277142C (en)
SG (1) SG94843A1 (en)
TW (1) TWI263079B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG121817A1 (en) * 2002-11-22 2006-05-26 Nishiyama Stainless Chemical Co Ltd Glass substrate for flat planel display, and process for producing the same
CN100343420C (en) * 2004-07-21 2007-10-17 常耀辉 Fast chemical grinding polishing bath liquid for stainless steel surface and its method
JP2007197236A (en) * 2006-01-25 2007-08-09 Nishiyama Stainless Chem Kk Method for manufacturing glass substrate for display and glass substrate
CN101089688B (en) * 2006-06-14 2010-09-29 比亚迪股份有限公司 Manufacturing method of superthin liquid crystal box
CN100392477C (en) * 2006-07-07 2008-06-04 南京大学 Liquid crystal display panel resource processing method
KR101233687B1 (en) * 2010-10-28 2013-02-15 삼성디스플레이 주식회사 Apparatus of etching a glass substrate
JP5829458B2 (en) * 2011-08-25 2015-12-09 株式会社Screenホールディングス Substrate processing equipment
CN103033403B (en) * 2011-09-29 2015-09-02 鞍钢股份有限公司 Preparation method of sheet metal film sample
CN102643028A (en) * 2012-05-14 2012-08-22 深圳市拓捷科技发展有限公司 Glass thinning equipment and method
CN102701597B (en) * 2012-06-26 2014-10-08 汕头市拓捷科技有限公司 Rapid glass thinning equipment
CN102701598B (en) * 2012-06-26 2015-09-30 广东拓捷科技有限公司 A kind of glass thinning apparatus of improvement
CN103046053B (en) * 2012-09-21 2015-04-01 中国兵器工业第二一三研究所 Chemical polishing method of stainless steel by high-temperature oxidation
CN103508676A (en) * 2013-07-24 2014-01-15 芜湖长信科技股份有限公司 Method for avoiding defect in LCD glass substrate thinning process and acid solution configuration method
TW201519308A (en) * 2013-11-13 2015-05-16 Grand Plastic Technology Corp Circulation type uniformly etching device
CN105541120A (en) * 2015-12-28 2016-05-04 常熟市金亿复合材料有限公司 Coating process for hollow glass plate
JP6323695B2 (en) * 2016-09-30 2018-05-16 パナソニックIpマネジメント株式会社 Polishing liquid for glass and polishing method
CN107286853A (en) * 2017-07-12 2017-10-24 天津津航技术物理研究所 A kind of devitrified glass high brightness chemical polishing solution and preparation method
CN107235641A (en) * 2017-08-14 2017-10-10 湖北工程学院 A kind of glass thinning etching solution and preparation method thereof
CN107902914A (en) * 2017-12-14 2018-04-13 天津美泰真空技术有限公司 A kind of glass substrate thinning technique etching solution
CN107814491A (en) * 2017-12-14 2018-03-20 天津美泰真空技术有限公司 A kind of flat glass substrate etching solution
CN109439329A (en) * 2018-10-29 2019-03-08 苏州博洋化学股份有限公司 FPD array process novel I GZO etching solution
CN109111859A (en) * 2018-10-30 2019-01-01 秦皇岛市大龙建材有限公司 Glass polishing solution
CN111029230B (en) * 2019-12-13 2022-04-05 山西长城微光器材股份有限公司 Micro-channel plate in-channel polishing method
CN111925126A (en) * 2020-08-12 2020-11-13 郑州恒昊光学科技有限公司 Paste for repairing slight scratch of optical glass
CN116042098B (en) * 2023-02-08 2024-11-29 广东粤港澳大湾区黄埔材料研究院 A nano-alumina polishing liquid and its application in infrared chalcogenide glass polishing

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854974A (en) * 1981-09-28 1983-04-01 三菱電機株式会社 Golf exerciser
JPH0641770A (en) * 1992-07-27 1994-02-15 Daikin Ind Ltd Silicon wafer surface treatment method
JPH07217707A (en) * 1994-02-01 1995-08-15 Yokohama Rubber Co Ltd:The Steel cord belt endless working method and cooling/ refrigerating device for practicing this mehtod

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY109592A (en) * 1992-11-16 1997-03-31 Tokyo Electron Ltd Method and apparatus for manufacturing a liquid crystal display substrate, and apparatus and method for evaluating semiconductor crystals.
JPH10109012A (en) * 1996-10-04 1998-04-28 Stec Kk Deodorizing method and deodorizing device for garbage disposal
JPH11111658A (en) * 1997-10-06 1999-04-23 Dainippon Screen Mfg Co Ltd Method and device for processing substrate
US6174371B1 (en) * 1997-10-06 2001-01-16 Dainippon Screen Mfg. Co., Ltd. Substrate treating method and apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5854974A (en) * 1981-09-28 1983-04-01 三菱電機株式会社 Golf exerciser
JPH0641770A (en) * 1992-07-27 1994-02-15 Daikin Ind Ltd Silicon wafer surface treatment method
JPH07217707A (en) * 1994-02-01 1995-08-15 Yokohama Rubber Co Ltd:The Steel cord belt endless working method and cooling/ refrigerating device for practicing this mehtod

Also Published As

Publication number Publication date
KR100380844B1 (en) 2003-04-18
CN1724432A (en) 2006-01-25
CN1277142C (en) 2006-09-27
TWI263079B (en) 2006-10-01
CN1380572A (en) 2002-11-20
KR20020080215A (en) 2002-10-23
CN100462319C (en) 2009-02-18

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