TWI260431B - Color filter substrate and fabricating method thereof - Google Patents

A color filter substrate essentially comprises a substrate, a black matrix, a color filter film, a common electrode layer and a plurality of spacers is disclosed. The black matrix is disposed on the substrate to surround a plurality of sub-pixel regions. The color filter film is disposed in the sub-pixel regions on the substrate. The common electrode layer is disposed on the substrate and covers the color filter film and the black matrix. The spacers are disposed on the common electrode layer. Each of the spacers comprises a first portion and a second portion. Each of the first portions has a first top surface, and each of the second portions has a second top surface. The first portion locates on the common electrode layer, and the second portion locates on part region of the first surface.

1260431 五、發明說明（1) 【發明所屬之技術領域】 本發明是有關於一種彩色濾光基板（C ο 1 〇 r f i 1 t e r s u b s t r a t e )及其製造方法，且特別是有關於一種間隙物 (Spacer)之頂面面積較小，以避免顯示不均勻問題（Push m u r a )的彩色濾、光基板及其製造方法。 【先前技術】 一般彩色液晶顯示器（L i q u i d C r y s t a 1 D i s p 1 a y， L C D )所使用之顯示面板主要係由一彩色濾光基板、一主動 元件陣列基板及配置於此兩基板間的一液晶層所構成。目 前液晶顯示器皆朝向全彩化、大尺寸、高解析度以及低成 本的方向發展，然而液晶顯示裝置之各種性能，如應答速 度、透明度對比值及可視角等，均與液晶層之膜厚有關。 為嚴密控制液晶層之厚度，一般均在彩色濾光基板與主動 元件陣列基板之間加入間隙物。間隙物可分為棒狀間隙 物、粒狀間隙物與光阻間隙物（P h 〇 t 〇 - s p a c e r )。為獲得均 勻厚度之液晶層，間隙物應平均分佈於彩色濾光基板與主 動元件陣列基板之間，但是棒狀與粒狀間隙物卻易成團塊 狀而使得液晶層厚度無法均一，必須實施額外製程使其均 勻分佈，因此造成生產成本的增加。 而若使用微影製程（Photolithography)所製作之光阻 間隙物，則除了能夠控制其分佈位置之外，也能控制其高 度，使得液晶層厚度能夠保持均一，因而廣為業界所採 用。在此，針對具有光阻間隙物之彩色濾光基板其製造流 程進行說明。1260431 V. INSTRUCTION DESCRIPTION OF THE INVENTION (1) Technical Field of the Invention The present invention relates to a color filter substrate (C ο1 〇rfi 1 tersubstrate) and a method of manufacturing the same, and more particularly to a spacer (Spacer) The top surface area is small to avoid the color filter of the mura (Push mura), the optical substrate, and the method of manufacturing the same. [Prior Art] A display panel used in a general color liquid crystal display (LCD) is mainly composed of a color filter substrate, an active device array substrate, and a liquid crystal disposed between the two substrates. The layer is composed. At present, liquid crystal displays are all oriented toward full color, large size, high resolution and low cost. However, various performances of liquid crystal display devices, such as response speed, transparency contrast value and viewing angle, are related to the film thickness of the liquid crystal layer. . In order to strictly control the thickness of the liquid crystal layer, a spacer is generally added between the color filter substrate and the active device array substrate. The spacers can be divided into rod-shaped spacers, granular spacers and photoresist spacers (P h 〇 t 〇 - s p a c e r ). In order to obtain a liquid crystal layer of uniform thickness, the spacers should be evenly distributed between the color filter substrate and the active device array substrate, but the rod-like and granular spacers are easily agglomerated, so that the thickness of the liquid crystal layer cannot be uniform, and must be implemented. The additional process makes it evenly distributed, thus causing an increase in production costs. If a photoresist spacer made by Photolithography is used, in addition to being able to control its distribution position, the height can be controlled so that the thickness of the liquid crystal layer can be kept uniform, and thus it is widely used in the industry. Here, the manufacturing process of the color filter substrate having the photoresist spacer will be described.

12865twf.ptd 第10頁 1260431 五、發明說明（2) 圖1 A〜1 E繪示為習知彩色濾光基板之製造流程剖面 圖，而圖2繪示為習知彩色濾光基板之製造方法中，在完 成共用電極層後形成間隙物的流程方塊圖。 請參照圖1 A，首先，提供一基板1 0 0，接著在基板1 0 0 上形成一黑矩陣（B 1 a c k m a t r i X ) 1 0 2。請參照圖1 B，然後 在基板1 0 0與黑矩陣1 0 2之上形成一彩色濾光薄膜1 0 4，其 中彩色濾光薄膜1 0 4係由數個紅色薄膜區塊、數個綠色薄 膜區塊以及數個藍色薄膜區塊所構成（圖未示）。請參照圖 1 C，隨後於彩色濾光薄膜1 0 4上形成覆蓋層（0 v e r c o a t i n g ) 1 0 6。請參照圖1 D，之後在覆蓋層1 0 6上形成共用 電極層1 0 8。請參照圖1 E，最後在共用電極層1 0 8表面上形 成光阻間隙物1 1 0，即完成彩色濾光基板1 2 0。 請繼續參照圖2，習知彩色濾光基板之製造方法中， 形成共用電極層後係進行光阻塗佈，以在電極層上形成一 光阻層。接著利用一光罩對光阻層進行曝光與顯影，即完 成間隙物之製作。 圖3繪示為習知彩色濾光基板在完成後與主動元件陣 列基板之組合示意圖。彩色濾光基板1 2 0與主動元件陣列 基板1 3 0之間由於存在光阻間隙物1 1 0，所以可保持一晶穴 間距（Cell gap)Hl。由於之後液晶（圖未示）係填入於彩色 濾光基板1 2 0與主動元件陣列基板1 3 0之間，因此光阻間隙 物1 1 0之厚度即決定了液晶層的厚度。 承上所述，習知彩色濾光基板中，由於間隙物之主要 功能係保持液晶層厚度的均勻，因此間隙物需以足夠的密12865twf.ptd Page 10 1260431 V. Description of the Invention (2) FIGS. 1A to 1E are cross-sectional views showing a manufacturing process of a conventional color filter substrate, and FIG. 2 is a view showing a method of manufacturing a conventional color filter substrate. In the process block diagram of forming a spacer after completing the common electrode layer. Referring to FIG. 1A, first, a substrate 100 is provided, and then a black matrix (B 1 a c k m a t r i X ) 1 0 2 is formed on the substrate 100. Referring to FIG. 1B, a color filter film 104 is formed on the substrate 100 and the black matrix 1 0 2, wherein the color filter film 104 is composed of a plurality of red film blocks and a plurality of green colors. The film block and a plurality of blue film blocks are formed (not shown). Referring to FIG. 1C, a cover layer (0 v e r c o a t i n g ) 1 0 6 is then formed on the color filter film 104. Referring to Fig. 1D, a common electrode layer 108 is formed on the cap layer 106. Referring to FIG. 1E, finally, a photoresist spacer 1 1 0 is formed on the surface of the common electrode layer 108, that is, the color filter substrate 120 is completed. Referring to Fig. 2, in the conventional method for manufacturing a color filter substrate, after forming a common electrode layer, photoresist coating is performed to form a photoresist layer on the electrode layer. The photoresist layer is then exposed and developed using a mask to complete the fabrication of the spacer. FIG. 3 is a schematic diagram showing the combination of a conventional color filter substrate and an active device array substrate after completion. Between the color filter substrate 120 and the active device array substrate 1 30, since there is a photoresist spacer 1 10, a cell gap H1 can be maintained. Since the liquid crystal (not shown) is filled between the color filter substrate 120 and the active device array substrate 130, the thickness of the photoresist spacer 1 10 determines the thickness of the liquid crystal layer. As described above, in the conventional color filter substrate, since the main function of the spacer is to keep the thickness of the liquid crystal layer uniform, the spacer needs to be sufficiently dense.

12865twf.ptd 第11頁 1260431 五、發明說明（3) 度分佈於共用電極層上。當液晶顯示面板承受側向外力 時，若間隙物與主動元件陣列基板之接觸面積過大，而導 致摩擦力太大時，則彩色濾光基板與主動元件陣列基板間 所產生之錯位將不易恢復，而造成液晶顯示面板之主動元 件陣列基板與彩色濾光片基板對位不良，進而影響液晶顯 不面板的顯不品質。 【發明内容】 因此，本發明的目的就是在提供一種彩色濾光基板， 適於解決間隙物與主動元件陣列基板之接觸面積過大，而 導致摩擦力太大時，容易造成液晶顯示面板在因受到側向 外力而形成錯位時，兩片基板間不易恢復初始狀態而影響 顯示效果的缺點。 本發明的再一目的就是在提供一種彩色濾光基板的製 造方法，適於在不增加製程步驟之繁複度的前提下，形成 與主動元件陣列基板之接觸面積較小的間隙物。 基於上述目的，本發明提出一種彩色濾光基板，主要 係由一基板、一黑矩陣、一彩色濾光薄膜、一共用電極層 及多個間隙物所構成。黑矩陣係配置於基板上且圍出多個 次晝素區。彩色濾光薄膜係配置於基板上之次畫素區中。 共用電極層係配置於基板上並覆蓋彩色濾光薄膜與黑矩 陣。間隙物係配置於共用電極層上。每一個間隙物包括一 第一部分與一第二部分，每一個第一部分具有一第一頂 面，而每一個第二部分具有一第二頂面。其中，第一部分 係位於共用電極層上，而第二部分係分別位於第一頂面的12865twf.ptd Page 11 1260431 V. Description of the invention (3) The degree is distributed on the common electrode layer. When the liquid crystal display panel is subjected to the lateral outward force, if the contact area between the spacer and the active device array substrate is too large, and the frictional force is too large, the misalignment between the color filter substrate and the active device array substrate is not easily recovered. As a result, the active device array substrate of the liquid crystal display panel and the color filter substrate are in poor alignment, thereby affecting the display quality of the liquid crystal display panel. SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a color filter substrate suitable for solving an excessive contact area between a spacer and an active device array substrate, and when the friction is too large, the liquid crystal display panel is likely to be affected. When the side is outwardly displaced to form a misalignment, the initial state of the two substrates is not easily restored, which affects the display effect. It is still another object of the present invention to provide a method of fabricating a color filter substrate which is suitable for forming a spacer having a small contact area with an active device array substrate without increasing the complexity of the process steps. Based on the above object, the present invention provides a color filter substrate mainly composed of a substrate, a black matrix, a color filter film, a common electrode layer, and a plurality of spacers. The black matrix system is disposed on the substrate and encloses a plurality of secondary halogen regions. The color filter film is disposed in the sub-pixel region on the substrate. The common electrode layer is disposed on the substrate and covers the color filter film and the black matrix. The interstitial system is disposed on the common electrode layer. Each of the spacers includes a first portion and a second portion, each of the first portions having a first top surface and each of the second portions having a second top surface. Wherein the first portion is located on the common electrode layer and the second portion is located on the first top surface

12865twf.ptd 第12頁 1260431 五、發明說明（4) 部分區域上。 在本實施例中，間隙物可位於黑矩陣上方。第二頂面 之面積可小於第二部分與第一部分之接觸面積。第一部份 與第二部分例如呈柱狀或錐狀。間隙物之高度可介於2 · 0 〜5 . 0微米。第一部分之高度可與第二部分之高度相同或 相異。第一部分與第二部分之材質可為正型光阻材料，且 第二部分之光敏感度可大於第一部分之光敏感度。或者， 第一部分與第二部分之材質可為負型光阻材料，且第一部 分之光敏感度可大於第二部分之光敏感度。彩色濾光基板 可再包括一覆蓋層，配置於基板與共用電極層之間，且覆 蓋彩色濾光薄膜與黑矩陣。 基於上述目的，本發明再提出一種彩色濾光基板的製 造方法。此方法係首先在一基板上形成一黑矩陣與一彩色 濾光薄膜。接著，在基板上方形成一共用電極層，並覆蓋 彩色濾光薄膜與黑矩陣。最後，在共用電極層上形成多個 間隙物。每一個間隙物包括一第一部分與一第二部分’每 一個第一部分具有一第一頂面，而每一個第二部分具有一 第二頂面。其中，第一部分係位於共用電極層上，而第二 部分係分別位於第一頂面的部分區域上。 在本實施例中，形成間隙物之方法可先在共用電極層 上形成一第一光阻層。接著在第一光阻層上形成一第二光 阻層，第一光阻層與第二光阻層具有不同的曝光/顯影特 性。最後對第一光阻層與第二光阻層進行曝光以形成上述 間隙物，其中第一部分係由第一光阻層所構成，而第二部12865twf.ptd Page 12 1260431 V. INSTRUCTIONS (4) On some areas. In this embodiment, the spacers may be located above the black matrix. The area of the second top surface may be smaller than the contact area of the second portion with the first portion. The first portion and the second portion are, for example, columnar or tapered. The height of the spacer may be between 2 · 0 and 5.0 μm. The height of the first part may be the same as or different from the height of the second part. The material of the first part and the second part may be a positive photoresist material, and the light sensitivity of the second part may be greater than the light sensitivity of the first part. Alternatively, the material of the first portion and the second portion may be a negative photoresist material, and the light sensitivity of the first portion may be greater than the light sensitivity of the second portion. The color filter substrate may further include a cover layer disposed between the substrate and the common electrode layer and covering the color filter film and the black matrix. Based on the above object, the present invention further proposes a method of manufacturing a color filter substrate. This method first forms a black matrix and a color filter film on a substrate. Next, a common electrode layer is formed over the substrate and covers the color filter film and the black matrix. Finally, a plurality of spacers are formed on the common electrode layer. Each of the spacers includes a first portion and a second portion. Each of the first portions has a first top surface and each of the second portions has a second top surface. Wherein the first portion is located on the common electrode layer and the second portion is located on a portion of the first top surface. In this embodiment, the method of forming the spacer may first form a first photoresist layer on the common electrode layer. A second photoresist layer is then formed over the first photoresist layer, the first photoresist layer and the second photoresist layer having different exposure/development characteristics. Finally, the first photoresist layer and the second photoresist layer are exposed to form the spacer, wherein the first portion is composed of the first photoresist layer, and the second portion

12865twf.ptd 第13頁 1260431 五、發明說明（5) 分係由第二光阻層所構成。此外，第一光阻層與第二光阻 層可為正型光阻，且第二光阻層之光敏感度係大於第一光 阻層之光敏感度。或者，第一光阻層與第二光阻層可為負 型光阻，且第一光阻層之光敏感度係大於第二光阻層之光 敏感度。 在本實施例中，形成間隙物之方法亦可係在共用電極 層上形成一光阻層。接著使用一半調式光罩（Half-tone m a s k )對光阻層進行曝光，以形成上述間隙物。其中，光 阻層可為正型光阻或負型光阻。 此外，在形成彩色濾光薄膜與黑矩陣後及形成共用電 極層之前，可在基板上形成一覆蓋層，覆蓋層係覆蓋彩色 濾光薄膜與黑矩陣。 縱上所述，在本發明之彩色濾光基板及其製造方法 中，僅需進行一次曝光即可形成具有階梯狀結構之間隙 物，且間隙物之頂面面積遠較習知間隙物小，因此可確保 液晶顯示面板在受到側向外力時，基板錯位可輕易恢復初 始狀態而不影響顯示效果。 為讓本發明之上述和其他目的、特徵、和優點能更明 顯易懂，下文特舉較佳實施例，並配合所附圖式，作詳細 說明如下。 【實施方式】 圖4 A〜4 G繪示為本發明第一實施例之彩色濾光基板其 製造方法的流程剖面示意圖，而圖5繪示為第一實施例中 另一選擇步驟之剖面示意圖。12865twf.ptd Page 13 1260431 V. INSTRUCTIONS (5) The sub-system consists of a second photoresist layer. In addition, the first photoresist layer and the second photoresist layer may be positive photoresists, and the light sensitivity of the second photoresist layer is greater than the light sensitivity of the first photoresist layer. Alternatively, the first photoresist layer and the second photoresist layer may be negative photoresist, and the light sensitivity of the first photoresist layer is greater than the light sensitivity of the second photoresist layer. In this embodiment, the method of forming the spacers may also form a photoresist layer on the common electrode layer. The photoresist layer is then exposed using a half-tone mask (Half-tone m a s k ) to form the spacers described above. Wherein, the photoresist layer can be a positive photoresist or a negative photoresist. Further, after forming the color filter film and the black matrix and before forming the common electrode layer, a cover layer may be formed on the substrate, and the cover layer covers the color filter film and the black matrix. In the above, in the color filter substrate of the present invention and the method of manufacturing the same, it is only necessary to perform one exposure to form a spacer having a stepped structure, and the top surface area of the spacer is much smaller than that of the conventional spacer. Therefore, it can be ensured that when the liquid crystal display panel is subjected to the lateral outward force, the substrate misalignment can be easily restored to the initial state without affecting the display effect. The above and other objects, features, and advantages of the present invention will be apparent from 4A to 4G are schematic cross-sectional views showing a method of manufacturing a color filter substrate according to a first embodiment of the present invention, and FIG. 5 is a cross-sectional view showing another selection step in the first embodiment. .

12865twf.ptd 第14頁 1260431 五、發明說明（6) 首先請參照圖4 A，在一基板2 1 0上例如形成一黑矩陣 材料層（未繪示），之後對此黑矩陣材料層進行微影製程或 微影製程加上蝕刻製程，以形成一黑矩陣2 2 0。若黑矩陣 2 2 0的組成材料為感光樹脂，則可使用微影製程形成此黑 矩陣2 2 0。若黑矩陣2 2 0的組成材料為鉻或其他金屬，則可 使用微影製程加上蝕刻製程形成黑矩陣2 2 0。此外，基板 2 1 0的材料可為玻璃與塑膠等透明基板。 接著請參照圖4B，在基板2 1 0上形成一彩色濾光薄膜 2 3 0，且例如覆蓋部分黑矩陣2 2 0。彩色濾光薄膜2 3 0可由 數個紅色光阻區塊（R )、數個綠色光阻區塊（G )與數個藍色 光阻區塊（B )所構成。彩色濾光薄膜2 3 0的形成方法例如是 先進行旋轉塗佈製程（Spin coat ing)以及烘烤製程等步 驟，形成一紅色光阻層（未繪示），然後進行微影製程以保 留特定區域處之紅色光阻層（未繪示）。接著再利用旋轉塗 佈與烘烤製程形成一綠色光阻層（未繪示），然後進行微影 製程保留特定區域處之綠色光阻層（未繪示），之後重複上 述步驟保留特定區域處之藍色光阻層（未繪示）。彩色濾光 薄膜2 3 0之紅、綠與藍色光阻區塊的排列方式，例如為馬 賽克排列（Mosaic type)、條狀排列（Stripe type)、四畫 素排列（Four pixels type)以及三角形排列（Triangle t y p e )等型態。 再者，黑矩陣2 2 0亦可由彩色濾光薄膜2 3 0的各色區塊 交疊而成。彩色濾光薄膜2 3 0之各色區塊亦可透過一圖案 化之罩幕（圖未示），例如以印刷或其他方式形成於基板12865twf.ptd Page 14 1260431 V. Description of the Invention (6) Referring first to FIG. 4A, a black matrix material layer (not shown) is formed on a substrate 210, and then the black matrix material layer is microscopically The shadowing process or the lithography process plus an etching process to form a black matrix 2 2 0. If the constituent material of the black matrix 2 2 0 is a photosensitive resin, the black matrix 2 2 0 can be formed using a lithography process. If the constituent material of the black matrix 220 is chromium or other metal, the black matrix 2 2 0 can be formed using a lithography process plus an etching process. Further, the material of the substrate 210 may be a transparent substrate such as glass or plastic. Next, referring to FIG. 4B, a color filter film 2 30 is formed on the substrate 2 10 and covers, for example, a portion of the black matrix 2 2 0 . The color filter film 203 may be composed of a plurality of red photoresist blocks (R), a plurality of green photoresist blocks (G), and a plurality of blue photoresist blocks (B). The color filter film 203 is formed by, for example, performing a spin coating process and a baking process to form a red photoresist layer (not shown), and then performing a lithography process to retain a specific A red photoresist layer (not shown) at the area. Then, a green photoresist layer (not shown) is formed by a spin coating and baking process, and then a lithography process is performed to retain a green photoresist layer (not shown) at a specific region, and then the above steps are repeated to retain a specific region. Blue photoresist layer (not shown). The arrangement of the red, green and blue photoresist blocks of the color filter film 203 is, for example, a mosaic type, a stripe type, a four pixel arrangement (Four pixels type), and a triangular arrangement. (Triangle type) and other types. Furthermore, the black matrix 2 2 0 may also be formed by overlapping the color blocks of the color filter film 230. The color blocks of the color filter film 203 can also be formed through a patterned mask (not shown), for example, printed or otherwise formed on the substrate.

12865twf.ptd 第15頁 1260431 —----- - -- 五、發明說明（7) 2 1 〇 上。 接著請參照圖4C，在基板2 1 0上例如形成一覆蓋層 2 4 0，覆蓋層2 4 0係覆蓋彩色濾光薄膜2 3 0 ，以在基板210上 方獲得平坦化之表面。此外，覆蓋層240通常為一透明之 介電材質。 接著請參照圖4 D，在覆蓋層2 4 0上形成一共用電極層 2 5 0，此共用電極層2 5 0材料可為銦錫氧化物（I T 0 )、銦鋅 氧化物（I Z 0 )等透明導電材質。 接著請參照圖4 E，在共用電極層2 5 0上形成一第一光 阻層260，並在第一光阻層260上形成一第二光阻層270。 其中，第一光阻層260與第二光阻層270具有不同的曝光/ 顯影特性。第一光阻層2 6 0與第二光阻層2 7 0可為正型光 阻，且第二光阻層270之光敏感度係大於第一光阻層260之 光敏感度。或者，第一光阻層260與第二光阻層270可為負 型光阻，且第一光阻層260之光敏感度係大於第二光阻層 2 7 0之光敏感度。 接著請參照圖4F與4G，當第一光阻層2 6 0與第二光阻 層2 7 0係正型光阻時，例如採用一光罩2 8 0對第一光阻層 2 6 0與第二光阻層2 7 0進行曝光，以形成間隙物2 9 0並完成 彩色濾光基板2 00。由於第一光阻層260與第二光阻層270 之光敏感度不同，因此在曝光後間隙物2 9 0會具有階梯狀 結構，且第二光阻層2 7 0所能保留的部分係小於第一光阻 層2 6 0。每一個間隙物2 9 0包括一第一部分2 6 2與一第二部 分2 7 2。其中，第一部分2 6 2係由第一光阻層2 6 0所構成，12865twf.ptd Page 15 1260431 —----- -- -- V. INSTRUCTIONS (7) 2 1 〇 ON. Next, referring to FIG. 4C, for example, a cover layer 250 is formed on the substrate 210, and the cover layer 240 is covered with the color filter film 203 to obtain a planarized surface above the substrate 210. In addition, the cover layer 240 is typically a transparent dielectric material. Next, referring to FIG. 4D, a common electrode layer 250 is formed on the cover layer 240, and the material of the common electrode layer 250 can be indium tin oxide (IT 0 ) or indium zinc oxide (IZ 0 ). Such as transparent conductive material. Next, referring to FIG. 4E, a first photoresist layer 260 is formed on the common electrode layer 250, and a second photoresist layer 270 is formed on the first photoresist layer 260. The first photoresist layer 260 and the second photoresist layer 270 have different exposure/development characteristics. The first photoresist layer 260 and the second photoresist layer 270 may be positive photoresists, and the light sensitivity of the second photoresist layer 270 is greater than the light sensitivity of the first photoresist layer 260. Alternatively, the first photoresist layer 260 and the second photoresist layer 270 may be negative photoresists, and the light sensitivity of the first photoresist layer 260 is greater than the light sensitivity of the second photoresist layer 210. Referring to FIG. 4F and FIG. 4G, when the first photoresist layer 206 and the second photoresist layer 270 are positive-type photoresist, for example, a photomask 280 is used for the first photoresist layer 2 60. Exposure is performed with the second photoresist layer 210 to form the spacers 290 and the color filter substrate 200 is completed. Since the light sensitivity of the first photoresist layer 260 and the second photoresist layer 270 are different, the spacers 2000 may have a stepped structure after the exposure, and the portion of the second photoresist layer 210 may be less than The first photoresist layer is 260. Each of the spacers 190 includes a first portion 262 and a second portion 272. Wherein, the first portion 262 is composed of the first photoresist layer 206.

12865twf.ptd 第16頁 1260431 -- ------- — 丨 " 1 五、發明說明（8) 而第二部分2 7 2係由第二光阻層2 7 0所構成。 請參照圖5與圖4G，當第一光阻層260與第二光阻層 2 7 0係負型光阻時，則例如採用一光罩2 8 2以進行後續的曝 光製程，同樣可獲得如圖4G所示之間隙物2 9 0。光罩2 8 2之 圖案可與圖4F之光罩280的圖案互補。 請參照圖4 G，本發明第一實施例之彩色濾光基板2 0 0 主要係由一基板2 1 0、一黑矩陣2 2 0、一彩色濾光薄膜 2 3 0、一覆蓋層2 4 0、一共用電極層2 5 0及多個間隙物2 9 0所 構成。其中，黑矩陣2 2 0配置於基板210上且圍出多個次畫 素區R。彩色濾光薄膜2 3 0係配置於基板2 1 0上之次晝素區R 中’且例如覆蓋部分黑矩陣2 2 0。覆蓋層2 4 0例如覆蓋彩色 濾光薄膜2 3 0與黑矩陣2 2 0。共用電極層2 5 0係配置於覆蓋 層2 4 0上。 間隙物2 9 0係配置於共用電極層2 5 0上，且例如位於黑 矩陣2 2 0上方，以避免降低液晶顯示面板之開口率 (A p e r t u r e r a t i 〇 )。本實施例中，間隙物2 9 0之高度可介 於2.0〜5·0微米。每一個間隙物290包括一第一部分262與 一第二部分272。第一部份262與第二部分272例如呈柱狀 或錐狀。第一部分262之高度可與第二部分272之高度相同 或相異。每一個第一部分262具有一第一頂面si ，而每一 個第二部272分具有一第二頂面S2。第一部分262係位於共 用電極層250上，第二部分272係位於第一頂面si的部分區 域上。換言之，間隙物2 9 0在後續與主動元件陣列基板（未 繪示）之接觸面積將可大幅縮小。12865twf.ptd Page 16 1260431 -- ------- — 丨 " 1 V. Inventive Note (8) and the second part 2 7 2 is composed of a second photoresist layer 270. Referring to FIG. 5 and FIG. 4G, when the first photoresist layer 260 and the second photoresist layer 270 are negative-type photoresist, for example, a mask 282 is used for subsequent exposure process, and the same can be obtained. The spacer 2 0 0 is shown in FIG. 4G. The pattern of the mask 2 8 2 can be complementary to the pattern of the mask 280 of Figure 4F. Referring to FIG. 4G, the color filter substrate 200 of the first embodiment of the present invention mainly comprises a substrate 2 1 0, a black matrix 2 2 0, a color filter film 2 30, and a cover layer 2 4 . 0, a common electrode layer 2 50 and a plurality of spacers 190. The black matrix 220 is disposed on the substrate 210 and encloses a plurality of sub-pixel regions R. The color filter film 203 is disposed in the sub-tenon region R on the substrate 2 10 and covers, for example, a portion of the black matrix 2 2 0 . The cover layer 240 covers, for example, the color filter film 2 30 and the black matrix 2 2 0. The common electrode layer 250 is disposed on the cover layer 240. The spacers 290 are disposed on the common electrode layer 250, and are located, for example, above the black matrix 220 to avoid reducing the aperture ratio of the liquid crystal display panel (A p e r t u r e r a t i 〇 ). In this embodiment, the height of the spacers 290 can be between 2.0 and 5.0 micrometers. Each spacer 290 includes a first portion 262 and a second portion 272. The first portion 262 and the second portion 272 are, for example, columnar or tapered. The height of the first portion 262 may be the same as or different from the height of the second portion 272. Each of the first portions 262 has a first top surface si and each of the second portions 272 has a second top surface S2. The first portion 262 is located on the common electrode layer 250 and the second portion 272 is located on a portion of the first top surface si. In other words, the contact area of the spacers 690 with the active device array substrate (not shown) can be greatly reduced.

12865twf.ptd 第17頁 1260431 五、發明說明（9) 圖6繪示為本發明第一實施例之彩色濾光基板的製造 方法中，在完成共用電極層後形成間隙物的流程方塊圖。 請參照圖6，在本發明第一實施例之彩色濾光基板的製造 方法中，形成共用電極層後係分次形成具有不同曝光/顯 影特性的兩層光阻層。接著利用一光罩對光阻層進行曝光 與顯影，即完成間隙物之製作。相較於習知彩色濾光基板 的製造方法，僅增加一次光阻層的形成步驟。 圖7 A〜7 C繪示為本發明第二實施例之彩色濾光基板其 製造方法的後段流程剖面示意圖，而圖8繪示為第二實施 例中另一選擇步驟之剖面示意圖。本發明第二實施例之彩 色濾光基板其製造方法中，前段流程係與圖4 A〜4 D所示相 同，在此即不再贅述。 請參照圖7 A，在共用電極層2 5 0上形成一光阻層3 1 0。 光阻層310可為正型光阻或負型光阻。 接著請參照圖7 B〜7 C，當光阻層3 1 0係正型光阻時， 例如採用一半調式光罩3 3 0對光阻層3 1 0進行曝光，以形成 間隙物3 2 0並完成彩色濾光基板2 0 2。由於半調式光罩3 3 0 具有透光區、半透光區及非透光區，因此在曝光後間隙物 320會具有階梯狀結構。藉由調整半調式光罩330之各透光 區域的位置與透光度以及曝光的光量，即可改變間隙物 3 2 0之外觀形狀。 請參照圖8與圖7 C，當光阻層3 1 0係負型光阻時，則例 如採用一半調式光罩3 3 2以進行後續的曝光製程，同樣可 獲得如圖7 C所示之間隙物3 2 0。半調式光罩3 3 2之圖案可為12865 twf.ptd page 17 1260431 V. Inventive Description (9) FIG. 6 is a block diagram showing a process of forming a spacer after completion of a common electrode layer in a method of manufacturing a color filter substrate according to a first embodiment of the present invention. Referring to Fig. 6, in the method of fabricating a color filter substrate according to the first embodiment of the present invention, after forming the common electrode layer, two layers of photoresist layers having different exposure/development characteristics are formed in stages. Then, the photoresist layer is exposed and developed by a photomask, that is, the spacer is completed. Compared to the conventional method of manufacturing a color filter substrate, the step of forming the photoresist layer is increased only once. 7A to 7C are schematic cross-sectional views showing a process of manufacturing a color filter substrate according to a second embodiment of the present invention, and Fig. 8 is a cross-sectional view showing another alternative step in the second embodiment. In the manufacturing method of the color filter substrate of the second embodiment of the present invention, the previous stage is the same as that shown in Figs. 4A to 4D, and will not be described again. Referring to FIG. 7A, a photoresist layer 3 1 0 is formed on the common electrode layer 250. The photoresist layer 310 can be a positive photoresist or a negative photoresist. Referring to FIG. 7B to FIG. 7C, when the photoresist layer 3 10 is a positive photoresist, the photoresist layer 310 is exposed, for example, by using a half-tone mask 3 30 to form a spacer 3 2 0 . And complete the color filter substrate 2 0 2 . Since the half-tone mask 320 has a light transmitting region, a semi-light transmitting region, and a non-light transmitting region, the spacer 320 has a stepped structure after exposure. By adjusting the position and transmittance of the light-transmitting regions of the half-tone mask 330 and the amount of light to be exposed, the appearance of the spacers 320 can be changed. Referring to FIG. 8 and FIG. 7C, when the photoresist layer 3 10 is a negative photoresist, for example, a half-tone mask 3 3 2 is used for the subsequent exposure process, and the same can be obtained as shown in FIG. 7C. Interstitial 3 2 0. Halftone mask 3 3 2 pattern can be

12865twf.ptd 第18頁 1260431 五、發明說明（ίο) 與圖7 B之光罩3 3 0的圖案互補。本發明第二實施例之彩色 濾光基板202的結構，係與圖4G之彩色濾光基板2 0 0相同， 在此即不再贅述。 圖9繪示為本發明第二實施例之彩色濾光基板的製造 方法中，在完成共用電極層後形成間隙物的流程方塊圖。 請參照圖9 ，在本發明第二實施例之彩色濾光基板的製造 方法中，形成共用電極層後係形成一光阻層。接著利用一 半調式光罩對光阻層進行曝光與顯影，即完成間隙物之製 作。相較於習知彩色濾光基板的製造方法，並未增加製程 步驟。 值得注意的是，在本發明之彩色濾光基板的製造方法 中，並不侷限於使用兩層光阻層，亦可使用更多層光阻。 若使用半調式光罩進行曝光，半調式光罩上之透光率亦可 呈現多階段的變化。 縱上所述，在本發明之彩色濾光基板及其製造方法 中，不論是藉由具有不同的曝光/顯影特性之多層光阻 層，或是使用半調式光罩進行曝光，皆僅需進行一次曝光 即可形成具有階梯狀結構之間隙物。同時，間隙物之頂面 面積遠較習知間隙物小，因此在組裝成液晶顯示面板後， 彩色濾光基板上之間隙物與元件陣列基板的接觸面積極 小。所以，可確保液晶顯示面板在受到側向外力時，間隙 物可輕易恢復初始狀態，而不改變晶穴間距，進而獲得理 想的顯示效果。 雖然本發明已以較佳實施例揭露如上，然其並非用以12865twf.ptd Page 18 1260431 V. Description of the Invention (ίο) Complementary to the pattern of the reticle 310 of Figure 7B. The structure of the color filter substrate 202 of the second embodiment of the present invention is the same as that of the color filter substrate 200 of FIG. 4G, and will not be described herein. Fig. 9 is a block diagram showing the formation of a spacer after completion of the common electrode layer in the method of fabricating the color filter substrate according to the second embodiment of the present invention. Referring to Fig. 9, in the method of fabricating a color filter substrate according to a second embodiment of the present invention, a photoresist layer is formed after forming a common electrode layer. Then, the photoresist layer is exposed and developed by using a half-tone mask, that is, the spacer is completed. Compared with the conventional method of manufacturing a color filter substrate, the process steps are not increased. It should be noted that in the method of fabricating the color filter substrate of the present invention, it is not limited to using two layers of photoresist layers, and more layers of photoresist may be used. If a half-tone mask is used for exposure, the light transmittance on the half-tone mask can also vary in multiple stages. In the longitudinal direction, in the color filter substrate of the present invention and the method of manufacturing the same, whether by using a multilayer photoresist layer having different exposure/development characteristics or using a halftone mask, exposure is only required. A spacer having a stepped structure can be formed in one exposure. At the same time, the top surface area of the spacer is much smaller than that of the conventional spacer. Therefore, after being assembled into a liquid crystal display panel, the contact surface of the spacer on the color filter substrate and the element array substrate are actively small. Therefore, it is ensured that when the liquid crystal display panel is subjected to the lateral outward force, the spacer can be easily restored to the initial state without changing the inter-cell spacing, thereby obtaining an ideal display effect. Although the present invention has been disclosed above in the preferred embodiment, it is not intended to be used

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12865twf.ptd 第20頁 1260431 圖式簡單說明 圖1 A〜1 E繪示為習知彩色濾光基板之製造流程剖面 圖。 圖2繪示為習知彩色濾光基板之製造方法中，在完成 共用電極層後形成間隙物的流程方塊圖。 圖3繪示為習知彩色濾光基板在完成後與主動元件陣 列基板之組合示意圖。 圖4 A〜4 G繪示為本發明第一實施例之彩色濾光基板其 製造方法的流程剖面示意圖。 圖5繪示為第一實施例中另一選擇步驟之剖面示意 圖。 圖6繪示為本發明第一實施例之彩色濾光基板的製造 方法中，在完成共用電極層後形成間隙物的流程方塊圖。 圖7 A〜7 C繪示為本發明第二實施例之彩色濾光基板其 製造方法的後段流程剖面示意圖。 圖8繪示為第二實施例中另一選擇步驟之剖面示意 圖。 圖9繪示為本發明第二實施例之彩色濾光基板的製造 方法中，在完成共用電極層後形成間隙物的流程方塊圖。 【圖式標示說明】 1 0 0、2 1 0 :基板 1 0 2、2 2 0 :黑矩陣 1 0 4、2 3 0 :彩色濾光薄膜 1 06、2 4 0 :覆蓋層 1 0 8、2 5 0 :共用電極層12865twf.ptd Page 20 1260431 BRIEF DESCRIPTION OF THE DRAWINGS Figures 1A to 1E are cross-sectional views showing the manufacturing process of a conventional color filter substrate. 2 is a block diagram showing a process of forming a spacer after completing a common electrode layer in a method of manufacturing a conventional color filter substrate. FIG. 3 is a schematic diagram showing the combination of a conventional color filter substrate and an active device array substrate after completion. 4A to 4G are schematic cross-sectional views showing the flow of a method of manufacturing a color filter substrate according to a first embodiment of the present invention. Figure 5 is a cross-sectional view showing another alternative step in the first embodiment. Fig. 6 is a block diagram showing the formation of a spacer after completion of the common electrode layer in the method of fabricating the color filter substrate according to the first embodiment of the present invention. 7A to 7C are cross-sectional views showing the flow of a color filter substrate according to a second embodiment of the present invention. Figure 8 is a cross-sectional view showing another alternative step in the second embodiment. Fig. 9 is a block diagram showing the formation of a spacer after completion of the common electrode layer in the method of fabricating the color filter substrate according to the second embodiment of the present invention. [Illustration description] 1 0 0, 2 1 0 : Substrate 1 0 2, 2 2 0 : Black matrix 1 0 4, 2 3 0 : Color filter film 1 06, 2 4 0 : Cover layer 1 0 8 2 5 0 : common electrode layer

12865twf.ptd 第21頁 1260431_ 圖式簡單說明 1 1 0 、2 9 0 、3 2 0 :間隙物 2 0 0、2 0 2 :彩色濾光基板 260 :第一光阻層 2 6 2 、3 2 2 ··第一部分 2 7 0 :第二光阻層 272 、324 :第二部分 2 8 0、2 8 2 :光罩 3 1 0 :光阻層 330、332 :半調式光罩 R :次晝素區 S1 ··第一頂面 S 2 :第二頂面12865twf.ptd Page 21 1260431_ BRIEF DESCRIPTION OF THE DRAWINGS 1 1 0 , 2 9 0 , 3 2 0 : spacers 2 0 0, 2 0 2 : color filter substrate 260: first photoresist layer 2 6 2 , 3 2 2 ··The first part 2 7 0 : The second photoresist layer 272 , 324 : The second part 2 8 0, 2 8 2 : The mask 3 1 0 : The photoresist layer 330 , 332 : The half-tone mask R : The second time Plain area S1 ··first top surface S 2 : second top surface

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