TWI537792B - Touch structure - Google Patents

觸控結構 Touch structure

本發明是有關於一種觸控結構，且特別是有關於一種具有連接線路的觸控結構。 The present invention relates to a touch structure, and more particularly to a touch structure having a connection line.

顯示器技術發展已朝向更人性化的人機介面，隨著平面顯示器的興起，採用觸控式面板已成主流，它取代鍵盤、滑鼠等等的輸入裝置，使得各種資訊設備產品在使用上更加容易。目前的觸控面板依其運作原理大致上可分為電容式、電阻式、光學式等，其中電容式觸控面板因具有高靈敏度而廣泛地應用於行動運算裝置中。 The development of display technology has been oriented towards a more human-machine interface. With the rise of flat-panel displays, touch-sensitive panels have become mainstream. It replaces the input devices of keyboards, mice, etc., making various information equipment products more usable. easily. At present, the touch panel can be roughly classified into a capacitive type, a resistive type, an optical type, etc., and the capacitive touch panel is widely used in a mobile computing device because of its high sensitivity.

一般來說，為了使觸控面板具有較佳的視覺效果，並考量到觸控電極的透光性與導電性，會採用網格細線來製作觸控電極，也就是觸控電極由交叉成網狀的細導線所形成。然而，由於週邊線路的導線較粗，因此當觸控電極的較細導線與週邊線路的較粗導線連接時，很容易在由細線轉粗線的區域發生斷線，導致觸控面板的良率與觸控能力下降。 In general, in order to make the touch panel have better visual effects and consider the light transmittance and conductivity of the touch electrode, the grid electrode is used to form the touch electrode, that is, the touch electrode is cross-connected. Formed by thin wires. However, since the wires of the peripheral lines are relatively thick, when the thinner wires of the touch electrodes are connected with the thicker wires of the peripheral lines, it is easy to break the wires in the region from the thin wires to the thick lines, resulting in the yield of the touch panel. The ability to touch is reduced.

本發明提供一種觸控結構，具有較佳的良率與觸控能力。 The invention provides a touch structure with better yield and touch capability.

本發明的觸控結構包括一觸控單元、一週邊線路以及一連接線路。連接線路包括連接圖案，用以連接觸控單元與週邊線路，連接圖案的線寬有至少兩種線寬，其中連接週邊線路的線寬大於連接觸控單元的線寬。 The touch structure of the present invention includes a touch unit, a peripheral line, and a connection line. The connection line includes a connection pattern for connecting the touch unit and the peripheral line, and the line width of the connection pattern has at least two line widths, wherein a line width connecting the peripheral lines is greater than a line width connecting the touch units.

在本發明的一實施例中，上述的觸控單元包括一感測串列，感測串列在一方向上延伸且包括多個網格電極，連接圖案的最小線寬大於或等於各網格電極的線寬。 In an embodiment of the invention, the touch unit includes a sensing series, the sensing series extends in a direction and includes a plurality of grid electrodes, and the minimum line width of the connection pattern is greater than or equal to each grid electrode. Line width.

在本發明的一實施例中，上述的觸控單元更包括多個虛擬電極，配置於網格電極之間且為電性浮置。 In an embodiment of the invention, the touch unit further includes a plurality of dummy electrodes disposed between the grid electrodes and electrically floating.

在本發明的一實施例中，上述的各虛擬電極具有網格結構。 In an embodiment of the invention, each of the dummy electrodes has a mesh structure.

在本發明的一實施例中，上述的觸控單元、連接線路以及週邊線路為一體成形。 In an embodiment of the invention, the touch unit, the connection line, and the peripheral line are integrally formed.

在本發明的一實施例中，上述的週邊線路包括一週邊導線，連接圖案的最大線寬小於或等於週邊導線的線寬。 In an embodiment of the invention, the peripheral line includes a peripheral wire, and the maximum line width of the connection pattern is less than or equal to the line width of the peripheral wire.

在本發明的一實施例中，上述的連接圖案包括一網格圖案。 In an embodiment of the invention, the connection pattern includes a grid pattern.

在本發明的一實施例中，上述的連接圖案包括一第一導線，第一導線連接觸控單元與週邊線路。 In an embodiment of the invention, the connection pattern includes a first wire, and the first wire connects the touch unit to the peripheral line.

在本發明的一實施例中，上述的連接圖案包括多條第一 導線，第一導線連接觸控單元與週邊線路。 In an embodiment of the invention, the connection pattern includes a plurality of first The wire, the first wire is connected to the touch unit and the peripheral line.

在本發明的一實施例中，上述的各第一導線的線寬隨著其遠離觸控單元且接近週邊線路而逐漸增加，且各第一導線的最小線寬大於或等於觸控單元的線寬且各第一導線的最大線寬小於或等於週邊線路的線寬。 In an embodiment of the invention, the line width of each of the first wires is gradually increased as it is away from the touch unit and close to the peripheral line, and the minimum line width of each of the first wires is greater than or equal to the line of the touch unit. The width of each of the first wires is less than or equal to the line width of the peripheral lines.

在本發明的一實施例中，上述的連接線路更包括位於觸控單元的端部處的至少一第二導線，至少一第二導線連接觸控單元與週邊線路。 In an embodiment of the invention, the connecting circuit further includes at least one second wire at an end of the touch unit, and at least one second wire connects the touch unit to the peripheral line.

在本發明的一實施例中，上述的至少一第二導線與觸控單元的端部重疊，且至少一第二導線的線寬大於或等於觸控單元的線寬。 In an embodiment of the invention, the at least one second wire overlaps the end of the touch unit, and the line width of the at least one second wire is greater than or equal to the line width of the touch unit.

在本發明的一實施例中，上述的連接圖案的線寬隨著其遠離觸控單元且接近週邊線路而逐漸增加。 In an embodiment of the invention, the line width of the connection pattern is gradually increased as it is away from the touch unit and close to the peripheral line.

本發明的觸控結構包括一觸控單元、一週邊線路以及一連接線路。連接線路包括一連接圖案，用以連接觸控單元與週邊線路，連接圖案包括一網格圖案，網格圖案有至少兩種網格密度，其中連接週邊線路的網格密度大於連接觸控單元的網格密度。 The touch structure of the present invention includes a touch unit, a peripheral line, and a connection line. The connection circuit includes a connection pattern for connecting the touch unit and the peripheral circuit, the connection pattern includes a grid pattern, and the grid pattern has at least two grid densities, wherein the grid density connecting the peripheral lines is greater than that of the connected touch unit Grid density.

在本發明的一實施例中，上述的觸控單元包括一感測串列，感測串列在一方向上延伸且包括多個網格電極，各網格電極的網格密度小於網格圖案的最小網格密度。 In an embodiment of the invention, the touch unit includes a sensing series, the sensing series extends in a direction and includes a plurality of grid electrodes, and the grid density of each grid electrode is smaller than the grid pattern. Minimum mesh density.

在本發明的一實施例中，上述的觸控單元更包括多個虛擬電極，配置於網格電極之間且為電性浮置。 In an embodiment of the invention, the touch unit further includes a plurality of dummy electrodes disposed between the grid electrodes and electrically floating.

在本發明的一實施例中，上述的各虛擬電極具有網格結構。 In an embodiment of the invention, each of the dummy electrodes has a mesh structure.

在本發明的一實施例中，上述的網格圖案的線寬相同。 In an embodiment of the invention, the grid pattern has the same line width.

在本發明的一實施例中，上述的網格圖案的線寬隨著其遠離觸控單元且接近週邊線路而逐漸增加。 In an embodiment of the invention, the line width of the grid pattern is gradually increased as it is away from the touch unit and close to the peripheral line.

在本發明的一實施例中，上述的觸控單元、連接線路以及週邊線路為一體成形。 In an embodiment of the invention, the touch unit, the connection line, and the peripheral line are integrally formed.

在本發明的一實施例中，上述的連接線路更包括配置於網格圖案與週邊線路之間的至少一第一導線，至少一第一導線連接網格圖案與週邊導線。 In an embodiment of the invention, the connecting circuit further includes at least one first wire disposed between the mesh pattern and the peripheral line, and the at least one first wire connects the mesh pattern and the peripheral wire.

在本發明的一實施例中，上述的至少一第一導線的線寬隨著其遠離網格圖案且接近週邊線路而逐漸增加，且至少一第一導線的最大線寬小於或等於週邊線路的線寬。 In an embodiment of the invention, the line width of the at least one first wire gradually increases as it moves away from the grid pattern and approaches the peripheral line, and the maximum line width of the at least one first wire is less than or equal to the perimeter line. Line width.

在本發明的一實施例中，上述的連接線路更包括位於觸控單元的端部處的至少一第二導線，至少一第二導線連接觸控單元與週邊線路。 In an embodiment of the invention, the connecting circuit further includes at least one second wire at an end of the touch unit, and at least one second wire connects the touch unit to the peripheral line.

在本發明的一實施例中，上述的至少一第二導線與觸控單元的端部重疊。 In an embodiment of the invention, the at least one second wire overlaps with an end of the touch unit.

在本發明的一實施例中，上述的網格圖案的網格密度隨著其遠離觸控單元且接近週邊線路而逐漸增加。 In an embodiment of the invention, the mesh density of the mesh pattern is gradually increased as it is away from the touch unit and close to the peripheral line.

本發明的觸控結構包括一觸控單元、一週邊線路以及一連接線路。觸控單元包括一感測串列。週邊線路包括一週邊導線。 連接線路包括多個第一導線，其中第一導線配置於感測串列與週邊導線之間且連接感測串列與週邊導線。 The touch structure of the present invention includes a touch unit, a peripheral line, and a connection line. The touch unit includes a sensing series. The peripheral line includes a perimeter conductor. The connection line includes a plurality of first wires, wherein the first wires are disposed between the sensing series and the peripheral wires and connect the sensing series and the peripheral wires.

在本發明的一實施例中，上述的感測串列在一方向上延伸且包括多個網格電極。 In an embodiment of the invention, the sensing series extends in a direction and includes a plurality of grid electrodes.

在本發明的一實施例中，上述的觸控單元更包括多個虛擬電極，配置於網格電極之間且為電性浮置。 In an embodiment of the invention, the touch unit further includes a plurality of dummy electrodes disposed between the grid electrodes and electrically floating.

在本發明的一實施例中，上述的虛擬電極具有網格結構。 In an embodiment of the invention, the dummy electrode has a mesh structure.

在本發明的一實施例中，上述的連接線路更包括至少一第二導線，至少一第二導線位於感測串列的端部處，至少一第二導線連接感測串列與第一導線。 In an embodiment of the invention, the connecting circuit further includes at least one second wire, the at least one second wire is located at an end of the sensing series, and the at least one second wire is connected to the sensing string and the first wire. .

在本發明的一實施例中，上述的至少一第二導線與感測串列的端部重疊。 In an embodiment of the invention, the at least one second wire overlaps the end of the sensing series.

基於上述，本發明採用連接週邊線路的線寬大於連接觸控單元的線寬的連接圖案，連接週邊線路的網格密度大於連接觸控單元的網格密度的連接圖案，或者是於觸控單元與週邊線路之間配置多條連接線。如此一來，解決由粗線轉細線或細線轉粗線時容易斷線之問題，使得觸控結構具有較佳的良率與觸控能力。 Based on the above, the present invention adopts a connection pattern in which the line width connecting the peripheral lines is larger than the line width connecting the touch units, and the connection density of the connection peripheral lines is larger than the connection pattern of the mesh density of the connection touch unit, or is in the touch unit. Multiple wires are connected to the surrounding lines. In this way, the problem of easy disconnection when the thick line or the thin line is turned to the thick line is solved, so that the touch structure has better yield and touch capability.

為讓本發明的上述特徵和優點能更明顯易懂，下文特舉實施例，並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.

10‧‧‧觸控裝置 10‧‧‧ touch device

20‧‧‧第一基板 20‧‧‧First substrate

30‧‧‧第一感測層 30‧‧‧First sensing layer

40‧‧‧第二基板 40‧‧‧second substrate

50‧‧‧第二感測層 50‧‧‧Second sensing layer

60、70、80‧‧‧黏著層 60, 70, 80‧‧ ‧ adhesive layer

100‧‧‧觸控結構 100‧‧‧ touch structure

102、SUB‧‧‧基板 102, SUB‧‧‧ substrate

104‧‧‧觸控區 104‧‧‧ touch area

106‧‧‧邊框區 106‧‧‧Border area

110‧‧‧觸控單元 110‧‧‧Touch unit

120、130‧‧‧感測串列 120, 130‧‧‧ Sensing series

122、132‧‧‧網格電極 122, 132‧‧‧ grid electrode

124、134‧‧‧橋接線 124, 134‧‧‧ Bridge wiring

126‧‧‧絕緣圖案 126‧‧‧Insulation pattern

136‧‧‧虛擬電極 136‧‧‧Virtual electrode

140‧‧‧連接線路 140‧‧‧Connected lines

142‧‧‧連接圖案 142‧‧‧Connected pattern

142a‧‧‧連接線 142a‧‧‧Connecting line

144、145、146‧‧‧導線 144, 145, 146‧‧‧ wires

150‧‧‧週邊線路 150‧‧‧ peripheral lines

152‧‧‧週邊導線 152‧‧‧ peripheral wires

A‧‧‧區域 A‧‧‧ area

D1、D2‧‧‧方向 D1, D2‧‧‧ direction

CG‧‧‧蓋板 CG‧‧‧ cover

DP‧‧‧顯示面板 DP‧‧‧ display panel

P、P0、P1、P2、P3‧‧‧格線週期 P, P0, P1, P2, P3‧‧ ‧ grid cycle

W0、W1、W2、W3、W4、W5、W(n+1)‧‧‧線寬 W0, W1, W2, W3, W4, W5, W(n+1)‧‧‧ line width

圖1A是依照本揭露的一實施例的一種觸控結構的示意圖。 FIG. 1A is a schematic diagram of a touch structure according to an embodiment of the disclosure.

圖1B為圖1A的區域A的放大圖。 FIG. 1B is an enlarged view of a region A of FIG. 1A.

圖1C是依照本揭露的一實施例的一種觸控結構的局部示意圖。 FIG. 1C is a partial schematic view of a touch structure according to an embodiment of the disclosure.

圖2是依照本揭露的一實施例的一種觸控結構的局部示意圖。 2 is a partial schematic view of a touch structure in accordance with an embodiment of the present disclosure.

圖3是依照本揭露的一實施例的一種觸控結構的局部示意圖。 3 is a partial schematic view of a touch structure in accordance with an embodiment of the present disclosure.

圖4是依照本揭露的一實施例的一種觸控結構的局部示意圖。 4 is a partial schematic view of a touch structure in accordance with an embodiment of the present disclosure.

圖5是依照本揭露的一實施例的一種觸控結構的局部示意圖。 FIG. 5 is a partial schematic diagram of a touch structure according to an embodiment of the disclosure.

圖6是依照本揭露的一實施例的一種觸控結構的示意圖。 FIG. 6 is a schematic diagram of a touch structure according to an embodiment of the disclosure.

圖7A與圖7B是依照本揭露的一實施例的一種觸控結構的示意圖。 7A and 7B are schematic diagrams of a touch structure according to an embodiment of the disclosure.

圖7C為圖7A與圖7B的局部放大圖。 Fig. 7C is a partial enlarged view of Figs. 7A and 7B.

圖8是依照本揭露的一實施例的一種觸控裝置的示意圖。 FIG. 8 is a schematic diagram of a touch device according to an embodiment of the disclosure.

圖9是依照本揭露的一實施例的一種觸控裝置的示意圖。 FIG. 9 is a schematic diagram of a touch device according to an embodiment of the disclosure.

圖10是依照本揭露的一實施例的一種觸控裝置的示意圖。 FIG. 10 is a schematic diagram of a touch device according to an embodiment of the disclosure.

圖11是依照本揭露的一實施例的一種觸控裝置的示意圖。 FIG. 11 is a schematic diagram of a touch device according to an embodiment of the disclosure.

圖12是依照本揭露的一實施例的一種觸控裝置的示意圖。 FIG. 12 is a schematic diagram of a touch device according to an embodiment of the disclosure.

圖1A是依照本揭露的一實施例的一種觸控結構的示意圖，以及圖1B為圖1A的區域A的放大圖，其中圖1A僅用以表示觸控結構的整體架構與各元件的分佈位置，而觸控單元、連接線路以及週邊線路的實施結構與連接方式請參照圖1B所繪示。請同時參照圖1A與圖1B，觸控結構100包括一觸控單元110、一連接線路140以及一週邊線路150。觸控結構100配置於基板102上。基板102例如是包括觸控區104與邊框區106。邊框區106圍繞觸控區104。觸控單元110例如是配置於觸控區104，連接線路140與週邊線路150例如是配置於邊框區106。在本實施例中，基板102可為諸如玻璃等硬質基板或諸如薄型玻璃、高分子材質等可撓基板。一般來說，基板102的撓曲半徑小於100mm。在本實施例中，觸控單元110例如是位於可視區，連接線路140與週邊線路150例如是可以位於不可視區，但本發明不以此為限。在另一實施例中，連接線路140也可以位於可視區。 1A is a schematic view of a touch structure according to an embodiment of the present disclosure, and FIG. 1B is an enlarged view of a region A of FIG. 1A, wherein FIG. 1A is only used to indicate the overall structure of the touch structure and the distribution position of each component. For the implementation structure and connection manner of the touch unit, the connection line, and the peripheral line, please refer to FIG. 1B. Referring to FIG. 1A and FIG. 1B , the touch structure 100 includes a touch unit 110 , a connection line 140 , and a peripheral line 150 . The touch structure 100 is disposed on the substrate 102. The substrate 102 includes, for example, a touch area 104 and a bezel area 106. The bezel area 106 surrounds the touch area 104. The touch unit 110 is disposed, for example, in the touch area 104 , and the connection line 140 and the peripheral line 150 are disposed, for example, in the frame area 106 . In the present embodiment, the substrate 102 may be a rigid substrate such as glass or a flexible substrate such as a thin glass or a polymer material. Generally, the deflection radius of the substrate 102 is less than 100 mm. In this embodiment, the touch unit 110 is located in the visible area, for example, the connection line 140 and the peripheral line 150 may be located in the invisible area, but the invention is not limited thereto. In another embodiment, the connection line 140 can also be located in the viewable area.

在本實施例中，觸控單元110例如是包括多個感測串列120、130，感測串列120在一方向D1上延伸且包括多個網格電極122與多個橋接線124，橋接線124配置於相鄰的網格電極122之間。感測串列130在另一方向D2上延伸且包括多個網格電極132與多個橋接線134，橋接線134配置於相鄰的網格電極132之間。 感測串列120與感測串列130交錯，且感測串列120與感測串列130絕緣。在本實施例中，感測串列120與感測串列130的交錯處，即橋接線124與橋接線134之間例如是配置有絕緣圖案126。在本實施例中，方向D1例如是X方向，方向D2例如是Y方向。方向D1與方向D2例如是垂直，但本發明不以此為限。在本實施例中，網格電極122、132的線寬W0例如是小於或等於5μm，使得觸控區104具有較佳的透光度。在本實施例中，將網格圖案的格線的中心點與格線的中心點之間的最短距離定義為格線週期，網格電極122、132具有格線週期P0。格線週期P0大於線寬W0，在本實施例中，格線週期P0例如為0.1~1mm。值得注意的是，網格電極122、132的數目、形狀、格線、網格圖案的形式可以任意變化，諸如格線也可以是曲線。 In this embodiment, the touch unit 110 includes, for example, a plurality of sensing series 120, 130. The sensing series 120 extends in a direction D1 and includes a plurality of grid electrodes 122 and a plurality of bridge lines 124, which are bridged. Line 124 is disposed between adjacent grid electrodes 122. The sense string 130 extends in the other direction D2 and includes a plurality of grid electrodes 132 and a plurality of bridge wires 134 disposed between adjacent grid electrodes 132. The sense train 120 is interleaved with the sense train 130 and the sense train 120 is insulated from the sense train 130. In the present embodiment, the staggered portion of the sensing series 120 and the sensing series 130, that is, between the bridge line 124 and the bridge line 134 is, for example, provided with an insulating pattern 126. In the present embodiment, the direction D1 is, for example, the X direction, and the direction D2 is, for example, the Y direction. The direction D1 and the direction D2 are, for example, vertical, but the invention is not limited thereto. In the present embodiment, the line width W0 of the grid electrodes 122, 132 is, for example, less than or equal to 5 μm, so that the touch area 104 has better transmittance. In the present embodiment, the shortest distance between the center point of the ruled line of the grid pattern and the center point of the ruled line is defined as the ruled line period, and the grid electrodes 122, 132 have the ruled line period P0. The ruled line period P0 is greater than the line width W0. In the present embodiment, the ruled line period P0 is, for example, 0.1 to 1 mm. It should be noted that the number, shape, grid line, and grid pattern of the grid electrodes 122, 132 may be arbitrarily changed, such as a grid line or a curve.

週邊線路150例如是包括多條週邊導線152，各週邊導線152例如是與一個感測串列120、130與一條週邊導線152連接。也就是說，週邊導線152與感測串列120、130具有一對一的對應關係。在本實施例中，週邊導線152例如是具有一線寬W(n+1)。週邊導線152例如是實心線路。週邊導線152的線寬W(n+1)可以依電阻需求設計，一般而言小於20μm的線寬規格可以得到窄邊框與足夠電阻值之需求。 The peripheral line 150 includes, for example, a plurality of perimeter conductors 152, each of which is coupled to a sense string 120, 130 and a perimeter conductor 152, for example. That is to say, the peripheral wires 152 have a one-to-one correspondence with the sensing series 120, 130. In the present embodiment, the peripheral wire 152 has, for example, a line width W(n+1). The peripheral wires 152 are, for example, solid wires. The line width W(n+1) of the peripheral wires 152 can be designed according to the resistance requirement. Generally, a line width specification of less than 20 μm can obtain a narrow bezel and a sufficient resistance value.

連接線路140包括連接圖案142，用以連接觸控單元110與週邊線路150，其中連接圖案142具有至少兩種的線寬W1、、、Wn，其中用以連接週邊線路150的連接圖案142的線寬Wn大於 用以連接觸控單元110的連接圖案142的線寬W1。在本實施例中，線寬W1、、、Wn例如是隨著其遠離觸控單元110且接近週邊線路150而逐漸增加，其中n為大於1的整數。在本實施例中，連接圖案142例如是一條導線，導線的線寬W1、、、Wn隨著其遠離觸控單元110且接近週邊線路150而逐漸增加。連接圖案142用以與一感測串列120、130連接。也就是說，連接圖案142與感測串列120、130具有一對一的對應關係。連接圖案142的線寬W1、、、Wn介於網格電極122、132的線寬W0及週邊導線152的線寬W(n+1)之間。也就是說，連接圖案142的線寬W1、、Wn大於或等於網格電極122、132的線寬W0且小於或等於週邊導線152的線寬W(n+1)，即W0≦W1、、、Wn≦W(n+1)。 The connection line 140 includes a connection pattern 142 for connecting the touch unit 110 and the peripheral line 150. The connection pattern 142 has at least two line widths W1, W, and Wn, wherein the line connecting the connection patterns 142 of the peripheral line 150 is connected. Width Wn is greater than The line width W1 of the connection pattern 142 for connecting the touch unit 110. In the present embodiment, the line widths W1, W, and Wn are gradually increased, for example, as they are away from the touch unit 110 and close to the peripheral line 150, where n is an integer greater than one. In the present embodiment, the connection pattern 142 is, for example, a wire, and the line widths W1, W, and Wn of the wires gradually increase as they are away from the touch unit 110 and close to the peripheral line 150. The connection pattern 142 is used to connect with a sensing series 120, 130. That is, the connection pattern 142 has a one-to-one correspondence with the sensing series 120, 130. The line widths W1, W, and Wn of the connection pattern 142 are interposed between the line width W0 of the mesh electrodes 122, 132 and the line width W (n + 1) of the peripheral wires 152. That is, the line widths W1, Wn of the connection patterns 142 are greater than or equal to the line width W0 of the grid electrodes 122, 132 and less than or equal to the line width W (n + 1) of the peripheral wires 152, that is, W0 ≦ W1, , Wn≦W(n+1).

連接圖案142具有漸進式變化的線寬W1、、、Wn。此漸進式變化的線寬W1、、、Wn可以是漸進規則變化。網格電極122具有線寬W0，連接圖案142具有線寬W1、、、Wn，週邊導線152具有線寬W(n+1)，其中(Wn-W(n-1))=d，d為大於零的常數。在本實施例中，(W(n+1)-Wn)例如是亦等於d。舉例來說，如圖1B所示，當n=3且d=4μm，W0=4μm、W1=8μm、W2=12μm、W3=16μm、W4=20μm，即網格電極122的線寬W0為4μm，連接圖案142的線寬W1、W2、W3為8μm、12μm與16μm，週邊導線152的線寬W4為20μm。 The connection pattern 142 has progressively varying line widths W1, , Wn. The line widths W1, W, Wn of this progressive change may be progressive rule changes. The grid electrode 122 has a line width W0, the connection pattern 142 has a line width W1,, and Wn, and the peripheral wire 152 has a line width W(n+1), where (Wn-W(n-1))=d, d is A constant greater than zero. In the present embodiment, (W(n+1) - Wn) is, for example, also equal to d. For example, as shown in FIG. 1B, when n=3 and d=4 μm, W0=4 μm, W1=8 μm, W2=12 μm, W3=16 μm, W4=20 μm, that is, the line width W0 of the grid electrode 122 is 4 μm. The line widths W1, W2, and W3 of the connection pattern 142 are 8 μm, 12 μm, and 16 μm, and the line width W4 of the peripheral wire 152 is 20 μm.

此漸進式變化的線寬W1、、、Wn也可以是漸進不規則變化，也就是(Wn-W(n-1))=d，d為大於零且不等於常數。舉例來 說，當n=4，W0=5μm、W1=6μm、W2=8μm、W3=12μm、W4=18μm、W5=20μm，即網格電極122的線寬W0為5μm，連接圖案142的線寬W1、W2、W3、W4為6μm、8μm、12μm、18μm，週邊導線152的線寬W5為20μm。 The line width W1, W, Wn of this progressive change may also be a progressive irregular change, that is, (Wn-W(n-1)) = d, d is greater than zero and not equal to a constant. For example When n=4, W0=5 μm, W1=6 μm, W2=8 μm, W3=12 μm, W4=18 μm, W5=20 μm, that is, the line width W0 of the grid electrode 122 is 5 μm, and the line width W1 of the connection pattern 142 is W1. W2, W3, and W4 are 6 μm, 8 μm, 12 μm, and 18 μm, and the line width W5 of the peripheral wire 152 is 20 μm.

此漸進式變化的線寬W1、、、Wn也可以是連續式變化，也就是(Wn-W(n-1))=d，d趨近於零且n趨近於無限大。舉例來說，W0=5μm、W1=5.001μm、W2=5.005μm、W3=5.009μm、W4=5.012μm、、、、直至W(n+1)=20μm，即網格電極122的線寬W0為5μm，連接圖案142的線寬W1、、、Wn由大於5μm連續變化至小於或等於20μm，週邊導線152的線寬W(n+1)為20μm。 The progressively varying line widths W1, , and Wn may also be continuous variations, that is, (Wn-W(n-1)) = d, d approaches zero and n approaches infinity. For example, W0=5 μm, W1=5.001 μm, W2=5.005 μm, W3=5.009 μm, W4=5.012 μm, ,, up to W(n+1)=20 μm, that is, the line width W0 of the grid electrode 122. 5 μm, the line widths W1, W, and Wn of the connection pattern 142 are continuously changed from more than 5 μm to less than or equal to 20 μm, and the line width W(n+1) of the peripheral wires 152 is 20 μm.

在本實施例中，連接線路140例如是更包括至少一導線144，導線144位於網格電極122、132的端部處，以連接觸控單元110與連接圖案142。詳細地說，網格電極122、132的端部包括網格電極122、132的格線末端以及格線末端附近的部分。在本實施例中，導線144例如是連接網格電極122、132的格線末端，且導線144未與網格電極122、132重疊。導線144的線寬例如是一致，且導線144的線寬例如是等於或大於網格電極122、132的線寬W0且等於或小於連接圖案142的最小線寬W1。在本實施例中，導線144的線寬例如是等於網格電極122、132的線寬W0。 In this embodiment, the connection line 140 further includes at least one wire 144 at the end of the grid electrode 122, 132 to connect the touch unit 110 and the connection pattern 142. In detail, the ends of the grid electrodes 122, 132 include the ends of the grid lines of the grid electrodes 122, 132 and the portions near the ends of the grid lines. In the present embodiment, the wires 144 are, for example, the ends of the grid lines connecting the grid electrodes 122, 132, and the wires 144 are not overlapped with the grid electrodes 122, 132. The line width of the wires 144 is, for example, uniform, and the line width of the wires 144 is, for example, equal to or larger than the line width W0 of the mesh electrodes 122, 132 and equal to or smaller than the minimum line width W1 of the connection pattern 142. In the present embodiment, the line width of the wire 144 is, for example, equal to the line width W0 of the grid electrodes 122, 132.

在本實施例中，是以觸控單元110與週邊線路150之間的連接圖案142具有漸變的線寬為例，但本發明不以此為限。因此，如圖1C所示，在連接圖案142中，只要連接週邊線路150的 線寬Wn(W4)大於連接觸控單元110的線寬W1即可，觸控單元110與週邊線路150之間的連接圖案142的線寬W1、W2、W3、W4也可以具有鋸齒狀變化。 In this embodiment, the connection pattern 142 between the touch unit 110 and the peripheral line 150 has a gradation line width as an example, but the invention is not limited thereto. Therefore, as shown in FIG. 1C, in the connection pattern 142, as long as the peripheral line 150 is connected The line width Wn (W4) may be greater than the line width W1 of the touch unit 110. The line widths W1, W2, W3, and W4 of the connection pattern 142 between the touch unit 110 and the peripheral line 150 may also have a zigzag change.

在本實施例中，是以連接圖案142是一條導線為例，但本發明不以此為限。請參照圖2，在本實施例的觸控結構100中，連接圖案142是網格圖案，其中用以連接週邊線路150的連接圖案142的線寬Wn大於用以連接觸控單元110的連接圖案142的線寬W1。在本實施例中，連接圖案142的線寬W1、、、Wn例如是隨著其遠離觸控單元110且接近週邊線路150而逐漸增加，但不以此為限。也就是說，網格圖案可以具有與對應圖1B之前一實施例所述的漸進式變化的線寬W1、、、Wn，也可以具有與對應圖1C之前一實施例所述的鋸齒狀變化的線寬W1、、、Wn。在本實施例中，連接圖案142的最小線寬W1例如是與網格電極122、132的線寬W0相同，連接圖案142的最大線寬Wn例如是與週邊線路150的線寬W(n+1)相同。舉例來說，網格電極122的線寬W0例如為5μm，連接圖案142的線寬W1、W2、W3、W4例如為5μm、10μm、15μm與20μm，週邊導線152的線寬W5例如為20μm。再者，在一實施例中，連接圖案142的最小線寬W1也可以大於網格電極122的線寬W0，諸如W0為4μm，連接圖案142的線寬W1、W2、W3、W4為8μm、12μm、16μm與20μm，週邊導線152的線寬W4為20μm。當然，在一實施例中，連接圖案142的最大線寬Wn也可以與週邊導線152的線寬W(n+1)不同。 In the embodiment, the connection pattern 142 is a wire, but the invention is not limited thereto. Referring to FIG. 2 , in the touch structure 100 of the present embodiment, the connection pattern 142 is a grid pattern, wherein the line width Wn of the connection pattern 142 for connecting the peripheral lines 150 is greater than the connection pattern for connecting the touch unit 110. The line width of 142 is W1. In this embodiment, the line widths W1, W, and Wn of the connection pattern 142 are gradually increased, for example, as they are away from the touch unit 110 and close to the peripheral line 150, but are not limited thereto. That is, the grid pattern may have a line width W1, Wn, Wn corresponding to the progressive change described in the previous embodiment of FIG. 1B, or may have a zigzag variation as described in the previous embodiment of FIG. 1C. Line widths W1, ,, Wn. In the present embodiment, the minimum line width W1 of the connection pattern 142 is, for example, the same as the line width W0 of the grid electrodes 122, 132, and the maximum line width Wn of the connection pattern 142 is, for example, the line width W (n+) with the peripheral line 150. 1) Same. For example, the line width W0 of the grid electrode 122 is, for example, 5 μm, the line widths W1, W2, W3, and W4 of the connection pattern 142 are, for example, 5 μm, 10 μm, 15 μm, and 20 μm, and the line width W5 of the peripheral wire 152 is, for example, 20 μm. Furthermore, in an embodiment, the minimum line width W1 of the connection pattern 142 may also be greater than the line width W0 of the grid electrode 122, such as W0 is 4 μm, and the line widths W1, W2, W3, and W4 of the connection pattern 142 are 8 μm. 12 μm, 16 μm and 20 μm, and the line width W4 of the peripheral wire 152 is 20 μm. Of course, in an embodiment, the maximum line width Wn of the connection pattern 142 may also be different from the line width W(n+1) of the peripheral wires 152.

其中，將連接圖案142的格線的中心點與格線的中心點之間的最短距離定義為格線週期P，在本實施例中，格線週期P為常數，且格線週期P大於網格圖案的線寬W1、、、Wn。格線週期P例如是300μm。連接圖案142的網格圖案與網格電極122、132的網格圖案連接且實質上一體成形，但連接圖案142的最小線寬W1大於或等於網格電極122、132的線寬W0。也就是說，感測串列120、130與連接圖案142實質上由連續的網格圖案形成，其中網格圖案的線寬由觸控區104至邊框區106逐漸增加。 The shortest distance between the center point of the ruled line of the connection pattern 142 and the center point of the ruled line is defined as the ruled line period P. In this embodiment, the ruled line period P is constant, and the ruled line period P is greater than the net. The line widths W1, W, and Wn of the grid pattern. The ruled line period P is, for example, 300 μm. The mesh pattern of the connection pattern 142 is connected to the mesh pattern of the grid electrodes 122, 132 and is substantially integrally formed, but the minimum line width W1 of the connection pattern 142 is greater than or equal to the line width W0 of the grid electrodes 122, 132. That is, the sensing series 120, 130 and the connection pattern 142 are substantially formed by a continuous grid pattern in which the line width of the grid pattern is gradually increased from the touch area 104 to the bezel area 106.

連接線路140例如是更包括至少一導線144與至少一導線146。導線144位於連接圖案142的端部處，以連接連接圖案142的格線末端與導線146。導線146位於導線144與週邊導線152之間，以連接導線144與週邊導線152。導線144、146例如是一體成形，導線144、146的線寬例如是大於或等於連接圖案142的最大線寬Wn且小於或等於週邊導線152的線寬W(n+1)。在本實施例中，是以連接圖案142的最大線寬W3與導線144、146的線寬相同為例，但在另一實施例中，導線144的線寬也可以大於連接圖案142的最大線寬W3，導線146的線寬也可以大於導線144的線寬，或者是導線146的線寬也可以隨著其遠離觸控單元110且接近週邊線路150而逐漸增加。也就是說，連接線路140的整體線寬可以由觸控區104至邊框區106的方向逐漸增加。 The connection line 140 further includes, for example, at least one wire 144 and at least one wire 146. A wire 144 is located at an end of the connection pattern 142 to connect the end of the ruled line of the connection pattern 142 with the wire 146. A wire 146 is located between the wire 144 and the peripheral wire 152 to connect the wire 144 with the peripheral wire 152. The wires 144, 146 are integrally formed, for example, and the line widths of the wires 144, 146 are, for example, greater than or equal to the maximum line width Wn of the connection pattern 142 and less than or equal to the line width W(n+1) of the peripheral wire 152. In the present embodiment, the maximum line width W3 of the connection pattern 142 is the same as the line width of the wires 144, 146, but in another embodiment, the line width of the wire 144 may also be greater than the maximum line of the connection pattern 142. The width W3, the line width of the wire 146 may also be greater than the line width of the wire 144, or the line width of the wire 146 may gradually increase as it moves away from the touch unit 110 and approaches the peripheral line 150. That is to say, the overall line width of the connection line 140 can be gradually increased from the direction of the touch area 104 to the bezel area 106.

特別一提的是，雖然在上述的實施例中都是繪示連接圖案142用以連接感測串列120與週邊線路150為例，但連接圖案 142也可以用以連接感測串列130與週邊線路150，或者是感測串列120與感測串列130都採用連接圖案142與週邊線路150連接。 In particular, although the connection pattern 142 is used to connect the sensing series 120 and the peripheral line 150 as an example in the above embodiments, the connection pattern is 142 can also be used to connect the sensing series 130 and the peripheral line 150, or both the sensing series 120 and the sensing series 130 are connected to the peripheral line 150 by using the connection pattern 142.

圖3是依照本揭露的一實施例的一種觸控結構的局部示意圖。圖3的觸控結構100的整體結構與圖2所示的觸控結構100相似，主要不同處在於連接圖案142的構型，因此圖3與下文是針對連接圖案142進行說明，其餘構件可以參照前文所述，於此不贅述。請參照圖3，在觸控結構100中，連接線路140包括連接圖案142，用以連接觸控單元110與週邊線路150，其中連接圖案142為網格圖案，網格圖案有至少兩種網格密度，其中連接週邊線路150的網格密度大於連接觸控單元110的網格密度。在本實施例中，網格圖案的網格密度例如是隨著其遠離觸控單元110且接近週邊線路150而逐漸增加。在本實施例中，連接圖案142的網格圖案的最小網格密度大於或等於網格電極122的網格圖案的網格密度。也就是說，連接圖案142的網格圖案與網格電極122、132連接且實質上一體成形，但網格圖案的網格密度由觸控區104至邊框區106逐漸增加，也就是網格圖案越來越密。 3 is a partial schematic view of a touch structure in accordance with an embodiment of the present disclosure. The overall structure of the touch structure 100 of FIG. 3 is similar to that of the touch structure 100 shown in FIG. 2, and the main difference lies in the configuration of the connection pattern 142. Therefore, FIG. 3 and the following are descriptions of the connection pattern 142, and the remaining components can be referred to. As mentioned above, it will not be described here. Referring to FIG. 3 , in the touch structure 100 , the connection line 140 includes a connection pattern 142 for connecting the touch unit 110 and the peripheral line 150 , wherein the connection pattern 142 is a grid pattern, and the grid pattern has at least two grids. Density, wherein the mesh density connecting the peripheral lines 150 is greater than the mesh density connecting the touch units 110. In the present embodiment, the mesh density of the mesh pattern is gradually increased as it is away from the touch unit 110 and close to the peripheral line 150. In the present embodiment, the minimum mesh density of the mesh pattern of the connection patterns 142 is greater than or equal to the mesh density of the mesh patterns of the mesh electrodes 122. That is, the mesh pattern of the connection pattern 142 is connected to the grid electrodes 122, 132 and substantially integrally formed, but the mesh density of the mesh pattern is gradually increased from the touch area 104 to the bezel area 106, that is, the mesh pattern. More and more dense.

連接圖案142的網格圖案具有至少兩種格線週期P(m-1)、P(m)，其中m為大於1的正整數。也就是說，連接圖案142具有漸進式變化的格線週期P(m-1)、P(m)。此漸進式變化的格線週期P(m-1)、P(m)可以是漸進規則變化。網格電極122具有格線週期P0，連接圖案142具有格線週期P(m-1)、P(m)，其中P(m-1)大於P(m)且(P(m-1)-P(m))=s，s等於常數。舉例來說，當n=3且 s=200，P0=500μm、P1=500μm、P2=300μm、P3=100μm，即網格電極122的格線週期P0為500μm，連接圖案142的格線週期P1、P2、P3為500μm、300μm與100μm。在本實施例中，網格電極122與連接圖案142的線寬例如是相同，即W0=W1=5μm，週邊導線152的線寬W(n+1)為20μm。 The mesh pattern of the connection pattern 142 has at least two ruled line periods P(m-1), P(m), where m is a positive integer greater than one. That is, the connection pattern 142 has a gradually changing grid period P(m-1), P(m). The progressively varying grid periods P(m-1), P(m) may be progressive rule changes. The grid electrode 122 has a ruled line period P0, and the connection pattern 142 has a ruled line period P(m-1), P(m), where P(m-1) is greater than P(m) and (P(m-1)- P(m))=s, s is equal to a constant. For example, when n=3 and s=200, P0=500 μm, P1=500 μm, P2=300 μm, P3=100 μm, that is, the grid line period P0 of the grid electrode 122 is 500 μm, and the grid line periods P1, P2, and P3 of the connection pattern 142 are 500 μm, 300 μm and 100 μm. In the present embodiment, the line width of the grid electrode 122 and the connection pattern 142 is, for example, the same, that is, W0=W1=5 μm, and the line width W(n+1) of the peripheral wire 152 is 20 μm.

在一實施例中，此漸進式變化的格線週期P(m-1)、P(m)可以是漸進不規則變化，即(P(m-1)-P(m))=s，s不等於常數。舉例來說，P0=500μm、P1=400μm、P2=100μm。在一實施例中，此漸進式變化的格線週期P(m-1)、P(m)可以是連續式變化，也就是(P(m-1)-P(m))=s，s趨近於零且m趨近於無限大。在一實施例中，格線的最大格線週期P(1)可以與網格電極122的格線週期P(0)相同。 In an embodiment, the progressively varying ruled line periods P(m-1), P(m) may be progressively irregular, ie, (P(m-1)-P(m))=s,s Not equal to a constant. For example, P0 = 500 μm, P1 = 400 μm, and P2 = 100 μm. In an embodiment, the progressively varying grid periods P(m-1), P(m) may be continuous variations, that is, (P(m-1)-P(m))=s,s Approaching zero and m approaching infinity. In an embodiment, the maximum ruled line period P(1) of the ruled line may be the same as the ruled line period P(0) of the grid electrode 122.

在本實施例中，連接圖案142的線寬例如是相同。在一實施例中，連接圖案142的線寬也可以隨著其遠離觸控單元110且接近週邊線路150而逐漸增加。舉例來說，P0=500μm、P1=300μm、P2=100μm，且d=5，W0=5μm、W1=10μm、W2=15μm、W3=20μm，W4為20μm。當然，在另一實施例中，d也可以不等於常數，W0=5μm、W1=6μm、W2=8μm、W3=12μm以及W4=20μm。 In the present embodiment, the line widths of the connection patterns 142 are, for example, the same. In an embodiment, the line width of the connection pattern 142 may also gradually increase as it is away from the touch unit 110 and close to the peripheral line 150. For example, P0 = 500 μm, P1 = 300 μm, P2 = 100 μm, and d = 5, W0 = 5 μm, W1 = 10 μm, W2 = 15 μm, W3 = 20 μm, and W4 is 20 μm. Of course, in another embodiment, d may not be equal to a constant, W0 = 5 μm, W1 = 6 μm, W2 = 8 μm, W3 = 12 μm, and W4 = 20 μm.

在本實施例中是以連接圖案142的網格圖案具有由觸控單元110至週邊線路150漸變密的網格密度為例，但本發明不以此為限。在另一實施例中，連接圖案142的網格圖案也可以具有其他變化，諸如由觸控單元110至週邊線路150為先增、後減、 再增、、、等變化。 In this embodiment, the mesh pattern of the connection pattern 142 has a mesh density which is gradually dense from the touch unit 110 to the peripheral line 150, but the invention is not limited thereto. In another embodiment, the grid pattern of the connection pattern 142 may also have other changes, such as increasing, decreasing, and decreasing by the touch unit 110 to the peripheral line 150. Add, change, and so on.

圖4是依照本揭露的一實施例的一種觸控結構的局部示意圖。圖4的觸控結構100的整體結構與圖1所示的觸控結構100相似，主要不同處在於連接線路140，因此圖4與下文是針對連接線路140進行說明，其餘構件可以參照前文所述，於此不贅述。請參照圖4，在觸控結構100的連接線路140中，連接圖案142包括多條連接線142a，多條連接線142a配置於一個感測串列120與一條週邊導線152之間且連接感測串列120與週邊導線152。也就是說，一個感測串列120藉由多條連接線142a與週邊導線152連接，因此具有多條連接線142a的連接圖案142又可稱為多通道結構。此外，在本實施例中，連接線路140例如是更包括至少一導線144、145，導線144、145位於網格電極122、132的端部處，以連接觸控單元110與連接線142a。在本實施例中，是以連接線路140包括多條導線144、145為例，其中一條導線144與網格電極122的末端連接且未與網格電極122重疊，而其他條導線145例如是與網格電極122的端部重疊。 4 is a partial schematic view of a touch structure in accordance with an embodiment of the present disclosure. The overall structure of the touch structure 100 of FIG. 4 is similar to that of the touch structure 100 shown in FIG. 1 . The main difference is the connection line 140. Therefore, FIG. 4 and the following description are for the connection line 140, and the remaining components may refer to the foregoing. I will not go into details here. Referring to FIG. 4 , in the connection line 140 of the touch structure 100 , the connection pattern 142 includes a plurality of connection lines 142 a , and the plurality of connection lines 142 a are disposed between one sensing series 120 and one peripheral lead 152 and the connection is sensed. The string 120 is connected to the perimeter conductor 152. That is, one sensing series 120 is connected to the peripheral wires 152 by a plurality of connecting lines 142a, and thus the connection pattern 142 having the plurality of connecting lines 142a may be referred to as a multi-channel structure. In addition, in the embodiment, the connection line 140 further includes at least one wire 144, 145, and the wires 144, 145 are located at the ends of the grid electrodes 122, 132 to connect the touch unit 110 and the connection line 142a. In the present embodiment, the connection line 140 includes a plurality of wires 144, 145, wherein one wire 144 is connected to the end of the grid electrode 122 and does not overlap the grid electrode 122, and the other wires 145 are, for example, The ends of the grid electrode 122 overlap.

在本實施例中，連接線142a例如是具有相同的線寬，但本發明不以此為限。在另一實施例中，如圖5所示，在觸控結構100的連接線路140中，各連接線142a的線寬W1、、、Wn也可以隨著其遠離觸控單元110且接近週邊線路150而逐漸增加，且連接線142a的線寬W1、、、Wn小於或等於週邊導線152的線寬。關於線寬W1、、、Wn的描述可以參照前文所述，於此不贅述。 In the present embodiment, the connecting lines 142a have the same line width, for example, but the invention is not limited thereto. In another embodiment, as shown in FIG. 5, in the connection line 140 of the touch structure 100, the line widths W1, W, and Wn of the connection lines 142a may also be away from the touch unit 110 and close to the peripheral lines. 150 is gradually increased, and the line widths W1, W, Wn of the connection line 142a are smaller than or equal to the line width of the peripheral wire 152. For the description of the line widths W1, , and Wn, reference may be made to the foregoing, and details are not described herein.

在上述的實施例中，感測串列120與感測串列130例如是配置於基板102的相同表面上，其中網格電極122、橋接線124以及網格電極132例如是由同一網狀導電層所形成，而橋接線134由另一網狀導電層所形成。在本實施例中，網格電極122、橋接線124以及網格電極132、連接圖案142以及週邊導線152的形成方法包括凹板轉印(Gravure off-set printing)、噴墨印刷(Ink-jet printing)或奈米壓印(Nano-imprinting)方式。絕緣圖案126的製作方法包括凹板轉印、噴墨印刷、奈米壓印或網版印刷方式。橋接線134的製作方法包括凹板轉印、噴墨印刷、奈米壓印或網版印刷方式。 In the above embodiment, the sensing series 120 and the sensing series 130 are, for example, disposed on the same surface of the substrate 102, wherein the grid electrode 122, the bridge line 124, and the grid electrode 132 are, for example, electrically conductive by the same mesh. A layer is formed and bridge wire 134 is formed by another mesh conductive layer. In the present embodiment, the grid electrode 122, the bridge wire 124, and the grid electrode 132, the connection pattern 142, and the peripheral wire 152 are formed by Gravure off-set printing, inkjet printing (Ink-jet). Printing) or nano-imprinting. The manufacturing method of the insulating pattern 126 includes concave plate transfer, ink jet printing, nano imprinting or screen printing. The method of fabricating the bridge wire 134 includes gravure transfer, ink jet printing, nanoimprinting or screen printing.

在另一實施例中，如圖6所示，感測串列120可以由一網狀導電層所形成，感測串列130可以由另一網狀導電層所形成，也就是網格電極122與橋接線124實質上一體成形，網格電極132與橋接線134實質上一體成形。其中，感測串列120與感測串列130可以配置於基板102的相同表面上，且感測串列120與感測串列130兩者之間配置有絕緣圖案126。此外，在一實施例中(未繪示)，感測串列120與感測串列130也可以配置於同一基板的相對表面上，或感測串列120與感測串列130分別配置於不同基板上再進行貼合。此外，觸控單元可以是其他種類的感測結構，諸如交錯配置的條狀觸控電極等。也就是說，上述的連接線路適於配置於各種觸控單元與週邊線路之間，以連接觸控單元與週邊線路。 In another embodiment, as shown in FIG. 6, the sensing series 120 may be formed by a mesh conductive layer, and the sensing series 130 may be formed by another mesh conductive layer, that is, the grid electrode 122. Formed substantially integrally with the bridge wire 124, the grid electrode 132 is substantially integrally formed with the bridge wire 134. The sensing series 120 and the sensing series 130 may be disposed on the same surface of the substrate 102 , and the insulating pattern 126 is disposed between the sensing series 120 and the sensing series 130 . In addition, in an embodiment (not shown), the sensing series 120 and the sensing series 130 may also be disposed on opposite surfaces of the same substrate, or the sensing series 120 and the sensing series 130 are respectively disposed on The bonding is performed on different substrates. In addition, the touch unit may be other kinds of sensing structures, such as strip touch electrodes in a staggered configuration. That is to say, the above connecting circuit is adapted to be disposed between various touch units and peripheral lines to connect the touch unit and the peripheral lines.

圖7A與圖7B是依照本揭露的一實施例的一種觸控結構 的示意圖，以及圖7C為圖7A與圖7B的局部放大圖。請同時參照圖7A至圖7C，在本實施例之觸控結構100中，為了降低網格電極122、132的可視度，觸控單元110更包括虛擬電極136，虛擬電極136配置於網格電極122與網格電極132之間，其中虛擬電極136為電性浮置。在本實施例中，虛擬電極136例如是具有網格結構。也就是說，網格電極122、132與虛擬電極136可以由同一網狀導體層所形成，且此網狀導體層具有多個斷開處138，使得虛擬電極136與網格電極122、132電性絕緣。舉例來說，諸如藉由直接印刷製程一起形成觸控單元110、連接線路140以及週邊線路150，其中觸控單元110為包括多個斷開處的網狀導體層。斷開處138的寬度例如是約5~10μm。在本實施例中，是以感測串列120、感測串列130與虛擬電極136配置於基板102的相同表面上為例，但本發明不以此為限。舉例來說，當感測串列120與感測串列130可以配置於基板102的第一表面上，或者感測串列120與感測串列130分別配置於基板102的第一表面與第二表面上，虛擬電極136可以全部配置於基板的第一表面或第二表面上，或者是一部分的虛擬電極136配置於基板的第一表面上，一部分的虛擬電極136配置於基板的第二表面上。換言之，虛擬電極136在空間上配置於網格電極122、132之間即可，而可以與網格電極122、132配置在相同或不同表面上。在本實施例中，由於網格電極122、132之間配置有虛擬電極136，因此觸控結構100具有較佳的光學性質。 7A and 7B illustrate a touch structure according to an embodiment of the disclosure. FIG. 7C is a partial enlarged view of FIGS. 7A and 7B. Referring to FIG. 7A to FIG. 7C , in the touch structure 100 of the embodiment, in order to reduce the visibility of the grid electrodes 122 , 132 , the touch unit 110 further includes a dummy electrode 136 , and the dummy electrode 136 is disposed on the grid electrode. 122 is between the grid electrode 132 and the dummy electrode 136 is electrically floating. In the present embodiment, the dummy electrode 136 has, for example, a grid structure. That is, the grid electrodes 122, 132 and the dummy electrode 136 may be formed of the same mesh conductor layer, and the mesh conductor layer has a plurality of breaks 138 such that the dummy electrode 136 and the grid electrodes 122, 132 are electrically Sexual insulation. For example, the touch unit 110, the connection line 140, and the peripheral line 150 are formed by a direct printing process, wherein the touch unit 110 is a mesh conductor layer including a plurality of breaks. The width of the break 138 is, for example, about 5 to 10 μm. In the present embodiment, the sensing series 120, the sensing series 130 and the dummy electrode 136 are disposed on the same surface of the substrate 102 as an example, but the invention is not limited thereto. For example, when the sensing series 120 and the sensing series 130 can be disposed on the first surface of the substrate 102, or the sensing series 120 and the sensing series 130 are respectively disposed on the first surface of the substrate 102 and the first On both surfaces, the dummy electrodes 136 may all be disposed on the first surface or the second surface of the substrate, or a part of the dummy electrodes 136 may be disposed on the first surface of the substrate, and a portion of the dummy electrodes 136 may be disposed on the second surface of the substrate. on. In other words, the dummy electrode 136 may be spatially disposed between the grid electrodes 122, 132, and may be disposed on the same or different surfaces as the grid electrodes 122, 132. In the present embodiment, since the dummy electrodes 136 are disposed between the grid electrodes 122 and 132, the touch structure 100 has better optical properties.

在前述的實施例中，觸控結構100中的觸控單元110、連接線路140以及週邊線路150例如是一體成形。因此，可以在同一製程(諸如直接印刷製程)中在基板102上同時形成觸控單元110、連接線路140以及週邊線路150。詳細地說，可以凹板轉印(Gravure off-set printing)方式製備，並在凹板設計網格狀圖形，將感測區104的感測串列120、感測串列130以及虛擬電極136直接隔開，並可將週邊區106的連接線路140以及週邊線路150同時依所設計需求印刷在基板102上。如此一來，可藉由一次轉印同時得到具有所需線寬、線厚、電阻值的觸控單元110、連接線路140以及週邊線路150的各元件，其中線寬由觸控區104至邊框區106逐漸增加。再者，可以根據所需求之電阻值，設計連接圖案142的導線長度或線寬，匹配觸控單元110之網格狀網格電極122、132，以得到各個有效迴路電阻值之一致性。 In the foregoing embodiment, the touch unit 110, the connection line 140, and the peripheral line 150 in the touch structure 100 are integrally formed, for example. Therefore, the touch unit 110, the connection line 140, and the peripheral line 150 can be simultaneously formed on the substrate 102 in the same process (such as a direct printing process). In detail, it can be prepared by Gravure off-set printing, and a grid pattern is designed on the concave plate, and the sensing series 120, the sensing series 130 and the dummy electrode 136 of the sensing region 104 are formed. Directly spaced apart, and the connection line 140 of the peripheral area 106 and the peripheral line 150 are simultaneously printed on the substrate 102 according to the design requirements. In this way, the components of the touch unit 110, the connection line 140, and the peripheral line 150 having the required line width, line thickness, and resistance value can be simultaneously obtained by primary transfer, wherein the line width is from the touch area 104 to the border. Zone 106 is gradually increasing. Moreover, the wire length or line width of the connection pattern 142 can be designed according to the required resistance value, and the grid-like grid electrodes 122 and 132 of the touch unit 110 can be matched to obtain the consistency of the respective effective loop resistance values.

在本實施例中，由於網格電極122、132、連接圖案142以及週邊導線152等元件是使用印刷製程形成，因此其導線的剖面中，頂面與側面的相接處為一導角，或是頂面有一R值，再者，側面與底面的夾角為一銳角。相反地，藉由黃光製程所形成的導線的剖面中，其側面與底面的夾角則為一直角或因過蝕而呈現鈍角，與前述的特徵不同。再者，在相同印刷參數(如印刷速度)、相同油墨材料、固化參數(如固化溫度)下，導線線寬與導線線厚之間具有正相關之關係，也就是導線越寬則導線厚度越高，導線越窄則導線厚度越薄。因此，在一實施例中，網格電極122、132、連 接圖案142以及週邊導線152的導線線寬與導線線厚例如是具有正相關關係。 In this embodiment, since the components such as the grid electrodes 122, 132, the connection pattern 142, and the peripheral wires 152 are formed by using a printing process, the intersection of the top surface and the side surface is a lead angle in the cross section of the wire, or The top surface has an R value, and the angle between the side surface and the bottom surface is an acute angle. Conversely, in the cross section of the wire formed by the yellow light process, the angle between the side surface and the bottom surface is a right angle or an obtuse angle due to over-etching, which is different from the foregoing features. Furthermore, under the same printing parameters (such as printing speed), the same ink material, and curing parameters (such as curing temperature), there is a positive correlation between the wire width and the wire thickness, that is, the wider the wire, the more the wire thickness High, the narrower the wire, the thinner the wire thickness. Thus, in one embodiment, the grid electrodes 122, 132, and The wire width of the wiring pattern 142 and the peripheral wires 152 is, for example, positively correlated with the wire thickness.

也就是說，依不同設計，可藉由一次印刷即可產生不同之觸控單元110、連接線路140以及週邊線路150。由於觸控結構100不需經由真空鍍膜、黃光微影、蝕刻、雷射、、、等製程，使用直接印刷製程具有製程步驟簡單、機台成本低、並可大面積製造等優點。再者，由網格圖案構成的觸控結構100具有透光性佳、電阻值低、薄膜均勻性佳、且可依不同設計調整印刷圖案等優點。此外，亦可於捲對捲(roll to roll)製程大面積快速製造，應用於軟性電子電路及元件。 That is to say, according to different designs, different touch units 110, connection lines 140 and peripheral lines 150 can be generated by one printing. Since the touch structure 100 does not need to be subjected to vacuum coating, yellow lithography, etching, laser, and the like, the direct printing process has the advantages of simple process steps, low machine cost, and large-area manufacturing. Furthermore, the touch structure 100 composed of the grid pattern has the advantages of good light transmittance, low resistance value, good film uniformity, and adjustable printing patterns according to different designs. In addition, it can be quickly fabricated on a large roll to roll process for flexible electronic circuits and components.

觸控結構100的材料可為金屬、無機物、有機物等，金屬包括各類金屬、各類導電油墨(如：銀膠、銅膠、碳膠等)、各類複合性金屬化合物等，無機物可為金屬氧化物(如：ITO、FTO、ZnO、AZO、IZO等)，有機物可為導電/共軛高分子、奈米碳管、石墨烯、奈米銀線等。 The material of the touch structure 100 may be metal, inorganic matter, organic matter, etc. The metal includes various metals, various types of conductive inks (such as silver glue, copper glue, carbon glue, etc.), various composite metal compounds, etc., and the inorganic substances may be Metal oxides (such as ITO, FTO, ZnO, AZO, IZO, etc.), organic substances can be conductive / conjugated polymers, carbon nanotubes, graphene, nano silver wire and the like.

上述的觸控結構100可應用於各式觸控面板中，詳細說明如下。圖8是依照本揭露的一實施例的一種觸控裝置的示意圖。請參照圖8，觸控裝置10包括蓋板CG、基板SUB、觸控結構100、黏著層70、80以及顯示面板DP。在本實施例中，觸控結構100例如是配置於基板SUB上。觸控結構100藉由黏著層70與蓋板CG接合，以及基板SUB藉由黏著層80與顯示面板DP接合。在本實施例中，當基板SUB為玻璃基板時，此結構又稱為GG結構， 當基板SUB為薄膜基板時，此結構又稱為GF結構。在一實施例中，如圖9所示，觸控結構100也可以直接配置於蓋板CG上，而省略基板SUB與黏著層70的配置，此結構又稱為OGS結構。 The touch structure 100 described above can be applied to various touch panels, as described in detail below. FIG. 8 is a schematic diagram of a touch device according to an embodiment of the disclosure. Referring to FIG. 8 , the touch device 10 includes a cover CG, a substrate SUB, a touch structure 100 , an adhesive layer 70 , 80 , and a display panel DP . In the embodiment, the touch structure 100 is disposed on the substrate SUB, for example. The touch structure 100 is bonded to the cover CG by the adhesive layer 70, and the substrate SUB is bonded to the display panel DP by the adhesive layer 80. In this embodiment, when the substrate SUB is a glass substrate, the structure is also referred to as a GG structure. When the substrate SUB is a film substrate, this structure is also referred to as a GF structure. In an embodiment, as shown in FIG. 9 , the touch structure 100 can also be directly disposed on the cover CG, and the configuration of the substrate SUB and the adhesive layer 70 is omitted. This structure is also referred to as an OGS structure.

在上述的實施例中，是以觸控結構100配置於相同基板SUB的相同表面上，但本發明不以此為限。圖10是依照本揭露的一實施例的一種觸控裝置的示意圖。觸控裝置10包括蓋板CG、第一基板20、第一感測層30、第二基板40、第二感測層50、黏著層60、70、80以及顯示面板DP。其中，第一感測層30包括前述的感測串列120以及與其對應的連接線路140與週邊線路150，第二感測層50包括前述的感測串列130以及與其對應的連接線路140與週邊線路150，換言之，第一感測層30與第二感測層50形成前述的觸控單元110。在本實施例中，第一感測層30配置於第一基板20上且藉由黏著層70與蓋板CG接合。第二測層50配置於第二基板40上且藉由黏著層80與顯示面板DP接合。黏著層60配置在第一觸控層30與第二觸控層50之間，以黏合第一觸控層30與第二觸控層50。黏著層60可以例如是網狀，用以黏合第一觸控層30與第二觸控層50的串列交叉處。在本實施例中，當第一基板20與第二基板40為玻璃基板時，此結構又稱為GG2結構，當第一基板20與第二基板40為薄膜基板時，此結構又稱為GFF結構。 In the above embodiment, the touch structure 100 is disposed on the same surface of the same substrate SUB, but the invention is not limited thereto. FIG. 10 is a schematic diagram of a touch device according to an embodiment of the disclosure. The touch device 10 includes a cover CG, a first substrate 20, a first sensing layer 30, a second substrate 40, a second sensing layer 50, an adhesive layer 60, 70, 80, and a display panel DP. The first sensing layer 30 includes the foregoing sensing series 120 and the corresponding connecting line 140 and the peripheral line 150. The second sensing layer 50 includes the foregoing sensing series 130 and the corresponding connecting line 140 and The peripheral line 150, in other words, the first sensing layer 30 and the second sensing layer 50 form the aforementioned touch unit 110. In the embodiment, the first sensing layer 30 is disposed on the first substrate 20 and bonded to the cap plate CG by the adhesive layer 70. The second measuring layer 50 is disposed on the second substrate 40 and bonded to the display panel DP by the adhesive layer 80. The adhesive layer 60 is disposed between the first touch layer 30 and the second touch layer 50 to bond the first touch layer 30 and the second touch layer 50 . The adhesive layer 60 can be, for example, a mesh for bonding the tandem intersections of the first touch layer 30 and the second touch layer 50. In this embodiment, when the first substrate 20 and the second substrate 40 are glass substrates, the structure is also referred to as a GG2 structure. When the first substrate 20 and the second substrate 40 are film substrates, the structure is also called GFF. structure.

在本實施例中，是以第一觸控層30與第二觸控層50分別配置於第一基板20與第二基板40上，但本揭露不以此為限。 舉例來說，在一實施例中，如圖11所示，第一觸控層30也可以直接配置於蓋板CG上，而省略第一基板20與黏著層70的配置，此結構又稱為G1F結構。或者是，如圖12所示，在一實施例中，第一觸控層30與第二觸控層50可以配置於同一基板SUB的相對表面上，當基板SUB為薄膜基板時，此結構又稱為GF2結構。 In this embodiment, the first touch layer 30 and the second touch layer 50 are disposed on the first substrate 20 and the second substrate 40, respectively, but the disclosure is not limited thereto. For example, in an embodiment, as shown in FIG. 11 , the first touch layer 30 can also be directly disposed on the cover CG, and the configuration of the first substrate 20 and the adhesive layer 70 is omitted. G1F structure. Alternatively, as shown in FIG. 12, in an embodiment, the first touch layer 30 and the second touch layer 50 may be disposed on opposite surfaces of the same substrate SUB. When the substrate SUB is a film substrate, the structure is It is called GF2 structure.

再者，在前述的實施例中，都是以將第一觸控層30與第二觸控層50配置於顯示面板DP上，並藉由黏著層互相黏接為例，通常將此種結構稱作面板上(On cell)或面板外(Out cell)的觸控面板結構，但本揭露不以此為限。舉例來說，在一實施例中，也可以將第一觸控層30與第二觸控層50中至少一者配置於顯示面板DP內，而形成稱該面板內(In cell)結構。 Furthermore, in the foregoing embodiments, the first touch layer 30 and the second touch layer 50 are disposed on the display panel DP, and the adhesive layers are bonded to each other as an example. It is called a touch panel structure on an on cell or an out cell, but the disclosure is not limited thereto. For example, in an embodiment, at least one of the first touch layer 30 and the second touch layer 50 may be disposed in the display panel DP to form an in-cell structure.

綜上所述，在本發明的連接圖案中，連接週邊線路的線寬大於連接觸控單元的線寬，或連接週邊線路的網格密度大於連接觸控單元的網格密度，因此在觸控單元的細線寬與週邊線路的粗線寬之間提供緩衝區域。如此一來，能避免細線寬驟變至粗線寬的情況，以改善觸控單元與週邊線路的連接處容易發生斷線的問題。另一方面，亦可以藉由在一條觸控串列與一條週邊導線之間設置多條連接導線，以避免單一條連接導線斷線而導致短路的問題。因此，觸控結構具有較佳的良率與觸控能力。 In summary, in the connection pattern of the present invention, the line width connecting the peripheral lines is larger than the line width of the connected touch unit, or the mesh density of the connected peripheral lines is greater than the mesh density of the connected touch unit, so A buffer area is provided between the thin line width of the unit and the thick line width of the peripheral line. In this way, it is possible to avoid the case where the fine line width is suddenly changed to the thick line width, so as to improve the problem that the connection between the touch unit and the peripheral line is prone to disconnection. On the other hand, it is also possible to provide a plurality of connecting wires between a touch string and a peripheral wire to avoid the problem that the single connecting wire is broken and the short circuit is caused. Therefore, the touch structure has better yield and touch capability.

在一實施例中，使用諸如直接印刷等方式製作觸控結構的各元件，可一次性同時製備網格電極、連接圖案以及週邊導線。再者，利用具有細線寬的金屬導線，可以同時滿足觸控區對於透 光性與感測元件導電性的需求，以及週邊區對於窄線寬設計需求。因此，本發明之一實施例的觸控結構具備透光性佳、電阻值低、薄膜均勻性佳、且可依不同設計調整印刷圖案等優點。另外，本發明之一實施例的觸控結構具有製造步驟簡單、機台成本低、並可大面積製造的優點，並更可進一步廣泛地應用於軟性電子電路及元件，以及應用於捲對捲製程快速製造，符合現代化顯示器的需求以及量產性能的提升。 In one embodiment, the components of the touch structure are fabricated using methods such as direct printing, and the grid electrodes, the connection patterns, and the peripheral wires can be simultaneously fabricated at one time. Furthermore, by using a metal wire having a thin line width, it is possible to simultaneously satisfy the touch area. The need for optical and sensing element conductivity, as well as the peripheral area for narrow line width design requirements. Therefore, the touch structure of one embodiment of the present invention has the advantages of good light transmittance, low resistance value, good film uniformity, and adjustable printing patterns according to different designs. In addition, the touch structure of one embodiment of the present invention has the advantages of simple manufacturing steps, low machine cost, and large-area manufacturing, and can be further widely applied to soft electronic circuits and components, and to roll-to-roll. The process is fast manufacturing, meeting the needs of modern displays and increasing mass production performance.

雖然本發明已以實施例揭露如上，然其並非用以限定本發明，任何所屬技術領域中具有通常知識者，在不脫離本發明的精神和範圍內，當可作些許的更動與潤飾，故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

100‧‧‧觸控結構 100‧‧‧ touch structure

104‧‧‧觸控區 104‧‧‧ touch area

106‧‧‧邊框區 106‧‧‧Border area

120‧‧‧感測串列 120‧‧‧Sensor series

122‧‧‧網格電極 122‧‧‧ grid electrode

140‧‧‧連接線路 140‧‧‧Connected lines

142‧‧‧連接圖案 142‧‧‧Connected pattern

144、146‧‧‧導線 144, 146‧‧‧ wires

150‧‧‧週邊線路 150‧‧‧ peripheral lines

152‧‧‧週邊導線 152‧‧‧ peripheral wires

W0、W1、W2、W3、W4、W5、W(n+1)‧‧‧線寬 W0, W1, W2, W3, W4, W5, W(n+1)‧‧‧ line width